Samsung Corning Precision Materials Co., Ltd.

Corning Precision Materials Co., Ltd.

SeoHyun Kim

YoungZo Yoo

GunSang Yoon

Jeongwoo Park

Taejung Park

Gun Sang Yoon

Sang Ick Lee

Hyung Soo Shin

Seung Ho Yoo

Myong Woon Kim

Sang Jun Yim

SooHo Park

Sang Do Lee

Eun-Ho Choi

Bogyeong Kim

Hyunhee Lee

Young Zo Yoo

A conductive film substrate, a photovoltaic cell having the same, and a method of manufacturing the same. The conductive film substrate includes a base substrate and a transparent conductive film formed on the base substrate. The transparent conductive film is a zinc oxide thin film which has first texture structures and second texture structures concurrently formed on a surface thereof. The second texture structures are smaller than the first texture structures.

Conductive film substrate, photovoltaic cell having the same, and method of manufacturing the same

A zinc oxide precursor for use in deposition of a zinc oxide-based thin film contains a zincocene having the following formula or a derivative thereof: 

Zinc oxide precursor and method of depositing zinc oxide-based thin film using the same

A zinc oxide precursor for use in deposition of a zinc oxide-based thin film contains an alkyl zinc halide having the following formula: R&#x2014;Zn&#x2014;X, where R is an alkyl group CH, and X is a halogen group. The n is a number ranging from 1 to 4, and the alkyl group is one selected from among a methyl group, an ethyl group, an i-propyl group and a t-butyl group. The halogen group contains one selected from among F, Br, Cl and I. A method of depositing a zinc oxide-based thin film includes loading a substrate into a deposition chamber; and supplying the zinc oxide precursor which contains the above-described alkyl zinc halide and an oxidizer into the deposition chamber and forming a zinc oxide-based thin film on the substrate via chemical vapor deposition. The zinc oxide-based thin film is deposited on the substrate via atmospheric pressure chemical vapor deposition.

Zinc oxide precursor containing alkyl zinc halide and method of depositing zinc oxide-based thin film using the same

A light-emitting device and a method of fabricating the same, in which the light emission characteristics of the light-emitting device in the UV range are maximized such that a high-efficiency light-emitting device can be produced at low cost. For this, the method includes the step of forming a zinc oxide light-emitting layer on a base substrate, the zinc oxide light-emitting layer including zinc oxide doped with a dopant; and activating the dopant by rapidly heat-treating the zinc oxide light-emitting layer, so that light emission in an ultraviolet range is increased.

Light-emitting device and method of fabricating the same

A method of manufacturing a substrate for a photovoltaic cell, in which the high optical characteristic in a long-wavelength range available for the photovoltaic cell can be maintained, and at the same time, the amount of hazing can be increased. The method includes the step of forming a zinc oxide (ZnO) thin film layer doped with a dopant on a transparent substrate, and the step of controlling the surface structure of the zinc oxide thin film layer by etching the zinc oxide thin film layer using hydrogen plasma.

Method of manufacturing substrate for photovoltaic cell

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Chungcheongnam-do, South Korea

SeoHyun Kim