Applied Materials, Inc.

Senthil Kumar Nattamai Subramanian

Hanish Kumar Panavalappil Kumarankutty

Michael Robert Rice

Steven D Marcus

Gayatri Natu

Kirubanandan Naina Shanmugam

Christopher L Beaudry

Mahesh Arcot

Hari Venkatesh Rajendran

Nikshep M Patil

Madhukar Krishna

Sriharsha Dharmapura Sathyanarayanamurthy

Shivaprakash Padadayya Hiremath

Sankar Menon Cherubala Pathayapura

Yogesh Tomar

Kirubanandan Shanmugam Naina

Embodiments of an apparatus for coating a plurality of gas lines are provided herein. In some embodiments, an apparatus for coating a plurality of gas lines via an ALD process includes: an oven having an enclosure that defines an interior volume configured to house the plurality of gas lines, the enclosure having a door configured for transferring the plurality of gas lines into and out of the interior volume; a plurality of inlet ports disposed through a first wall of the enclosure; a plurality of exhaust ports disposed through a second wall of the enclosure; a fluid panel disposed outside of the oven and coupled to the plurality of inlet ports via corresponding ones of a plurality of fluid distribution assemblies; and a foreline disposed outside of the oven and coupled to the plurality of exhaust ports.

Atomic layer deposition coating system for inner walls of gas lines

A method includes performing an atomic layer deposition (ALD) process with respect to a plurality of target elements to coat interiors of the plurality of target elements with a protective coating. Performing the ALD process includes alternating delivery of a first precursor inside the plurality of target elements for a first duration to form an adsorption layer on the interiors of the plurality of target elements, alternating purging of the first precursor from the plurality of target elements for a second duration, and alternating delivery of a second precursor inside the plurality of target elements for a third duration to cause the second precursor to react with the adsorption layer and form a target layer on the interiors of the plurality of target elements.

Parallel atomic layer deposition of target element interiors

Methods and apparatus for coating processing reactor component parts are provided herein. In some embodiments, a part coating reactor includes: a lower body and a lid assembly that together define and enclose an interior volume; one or more heaters disposed in the lid assembly; one or more coolant channels disposed in the lid assembly to flow a heat transfer medium therethrough; a plurality of gas passages disposed through the lid assembly to facilitate providing one or more gases to the interior volume, wherein the plurality of gas passages include a plurality of fluidly independent plenums disposed in the lid assembly; and one or more mounting brackets to facilitate coupling a workpiece to the lid assembly.

Atomic layer deposition part coating chamber

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Hosur, India

Senthil Kumar Nattamai Subramanian