Canon Kabushiki Kaisha

Sentaro Aihara

Koji Ishibashi

Ken Minoda

Yuichiro Oguchi

Ken Katsuta

Takehiko Ueno

Yeshwanth Srinivasan

Shintaro Narioka

Steven Wayne Burns

Hotaka Kusano

Yosuke Takarada

Fuma Kizu

Toshiyuki Sato

A simulation method is performed for simulating a behavior of a curable composition in a film forming apparatus that brings the curable composition arranged on a first member and a second member into contact with each other, and forms a film of the curable composition on the first member. The method includes obtaining a difference between a nominal value for simulating the behavior and an actual value corresponding to the nominal value in the film forming apparatus, and simulating the behavior using, as input information, the actual value obtained from the nominal value and the difference.

Simulation method, simulation apparatus, computer readable medium, film forming apparatus, and method of manufacturing article

An imprint apparatus that brings a mold and an imprint material on a substrate into contact with each other to form a pattern of the imprint material on the substrate is provided. The apparatus comprises a supplying unit configured to supply the imprint material to the substrate, and a control unit configured to control the supplying unit in accordance with arrangement data of the imprint material that indicates a position where the imprint material is to be supplied on the substrate, wherein the control unit determines the arrangement data based on a feature related to a spread of a droplet of the imprint material on the substrate.

Imprint apparatus, method of manufacturing article, planarized layer forming apparatus, information processing apparatus, and determination method

An evaluation apparatus that evaluates a composition formed on a substrate by forming processing is provided. The apparatus comprises an obtaining device that obtains an image including the composition by the forming processing, and a processing device that processes the image for the evaluation. The processing device outputs a feature of each of one or more abnormalities in the image according to an inference model, obtains information regarding a formation region on the substrate where the composition has been formed, determines the kind of each of the abnormalities based on the output feature of each of the abnormalities and a relationship between the information and a position and a size of the abnormality, and makes, based on a result of the determination, final determination as to whether the image is a normal image or an image including an abnormality.

Evaluation apparatus, computer-readable storage medium, evaluation method, forming system, and article manufacturing method

The present invention provides an information processing apparatus including a processing unit configured to perform a process of outputting information indicating a contact state between a mold and a composition on a substrate, wherein the processing unit obtains a plurality of points representing a contour shape of a portion where the mold and the composition on the substrate are in contact with each other while at least one process of a contact process and a mold releasing process is performed, and outputs the information indicating the contact state based on the plurality of points.

Information processing apparatus, molding apparatus, molding method, and article manufacturing method

In order to provide an information processing apparatus in which a correction work time for coating information is shortened, an information processing apparatus for an imprint apparatus configured to perform an imprint process of forming a pattern on an imprint material (R) on a substrate (W) using a mold on the basis of coating information indicating a position of the imprint material (R) includes: at least one processor or circuit which function as: an obtaining unit configured to obtain inspection information regarding a result of an inspection of the substrate (W) which has been subjected to the imprint process; an analysis unit configured to analyze the inspection information and obtain analysis information associated with the result of the imprint process; and a display control unit configured to display at least any of the inspection information and the analysis information on a screen of a display apparatus at the same time with the coating information.

Information processing apparatus, information processing method, and computer program

The present invention provides an imprint apparatus that performs imprint processing of forming a pattern of an imprint material on a substrate using a mold, the apparatus including an image sensing unit configured to sense at least one of the mold and the substrate and obtain an image, and a determination unit configured to determine normality/abnormality of the imprint processing, wherein the imprint processing includes a first step of supplying the imprint material onto the substrate, and a second step of bringing the mold and the imprint material on the substrate into contact with each other, and the determination unit changes a reference of determination of the normality/abnormality of the imprint processing for each step of the imprint processing and determines the normality/abnormality of the imprint processing based on the image sensed by the image sensing unit.

Imprint apparatus

The present invention provides an imprint apparatus which forms a relief pattern in an imprint material on a substrate using a mold, the apparatus including a curing unit configured to cure the imprint material, a moving unit configured to relatively move the mold and the substrate, a detection unit configured to detect a pattern of light reflected by the mold and light reflected by the substrate, and a processing unit configured to obtain information on a separation state of the mold and the cured imprint material on the substrate based on the pattern detected by the detection unit while separating the mold from the imprint material by widening, using the moving unit, an interval between the mold and the substrate.

Imprint apparatus and method of manufacturing article

The present invention provides an imprint apparatus which forms a pattern of an imprint material onto a substrate by using a mold, the apparatus including a control unit configured to provide a user interface for displaying a first map indicating a supply position of the imprint material to be supplied onto the substrate, an adjustment window for adjusting a value of an apparatus parameter which is set in the imprint apparatus and used to change a supply position of the imprint material, and a second map indicating a supply position of the imprint material after adjustment of the value of the apparatus parameter.

Imprint apparatus, method of manufacturing article, information processing apparatus, method of supporting map editing, and storage medium

An image pickup apparatus includes a receiver that receives, from an external apparatus, an instruction for changing a zoom position of a lens, a controller that performs control processing to change a zoom position of the lens based on a received instruction, and a determination unit that determines whether the external apparatus includes a function regarding zooming of the lens. While determining the external apparatus including the function, the controller controls a zoom adapter, which performs a zoom setting of the lens and is attached to the lens, to change a zoom position of the lens based on a zoom setting notified by the external apparatus. While determining the external apparatus not including the function, the controller controls the zoom adapter to change a zoom position of the lens based on a zoom setting performed in the zoom adapter.

Imprinting apparatus, imprinting method, and article manufacturing method

An imprinting method is capable of strictly interpolating application distribution of uncured resin material being applied to a substrate for each shot and interpolating application distribution of uncured resin material for each shot while reducing workload in a generation step. The imprinting apparatus includes a mold; a mold driving unit; a dispenser that applies uncured resin material to the substrate; a light source that cures uncured resin material as a pattern; a dispenser control unit that controls the dispenser by generating the application distribution of the uncured resin material to the resin pattern for each of a plurality of shots; and a main control unit that interpolates application distribution of uncured resin material, which has been generated by the dispenser control unit, using shot layout information of relative position among positions of a plurality of shots, the dispenser, and the light source with respect to the substrate, as variables.

Imprinting method and imprinting apparatus, sample shot extraction method, and article manufacturing method using same

Provided is an imprinting method that is capable of strictly performing the interpolation of the application distribution of an uncured resin material to be applied to a substrate for each shot as well as efficiently performing the reinterpolation of the application distribution of the uncured resin material for each shot while reducing the workload in a generation step. The imprinting apparatus of the present invention includes a moldon which a mold pattern is formed; a mold driving unitthat allows the moldmove toward and away from a substrate; a dispenserthat applies an uncured resin material to the substrate; a light sourcethat cures the uncured resin material as a resin pattern; a dispenser control unitthat controls the dispenserby generating the application distribution of the uncured resin material to the resin pattern for each of a plurality of shots; and a main control unitthat interpolates the application distribution of the uncured resin material, which has been generated by the dispenser control unit, using shot layout information in consideration of the relative position among the positions of a plurality of shots, the dispenser, and the light sourcewith respect to the substrate, as variables.

An exposure apparatus for exposing a substrate to radiation based on parameters. The apparatus includes a display, an input device, and a processor configured to execute a program for editing the parameters. The processor is configured to cause, in accordance with the program, the display to display a first group of a first classification name for classifying the parameters, a plurality of names of works to be executed by the apparatus, a second group of a second classification name for classifying the parameters, a plurality of names of functions, each of which is contained in at least one of the works, and contents of parameters corresponding to a combination of one of the plurality of names of works of the first classification name and one of the plurality of names of functions of the second classification name, respectively selected by the input device.

Growing community of inventors

Utsunomiya, Japan

Sentaro Aihara