Nippon Telegraph and Telephone Corporation

Seitaro Matsuo

Katsuhiro Harada

Masaru Shimada

Emi Tamechika

Yoshiaki Mimura

Yasuhiro Torii

Iwao Watanabe

Hiroshi Nishimura

Toshiyuki Horiuchi

Mikiho Kiuchi

Yoshinobu Takeuchi

Kazuhiko Komatsu

According to this invention, illumination light for illuminating a mask on which a micropattern is drawn is inclined at an angle corresponding to a numerical aperture of an optical projection lens located below the mask with respect to an optical axis. The illumination light is obliquely incident on the mask to expose the micropattern on an object located below the optical projection lens.

Optical projection exposure method and system using the same

Microwave transforming method and plasma processing

In a microwave ion source utilizing a microwave and a magnetic field, a microwave introducing window has a multilayer structure of plates with different dielectric constants, a magnetic circuit is arranged to generate a magnetic field having a higher intensity than that defined by ECR (Electron Cyclotron Resonance) conditions so as to form a narrow high-density plasma, an ion extraction electrode has an ion extraction window whose contour falls within a center region of the narrow high-density plasma.

Microwave ion source

Growing community of inventors

Atsugi, Japan

Seitaro Matsuo