Tdk Corporation

Seiji Yari

Atsushi Yamaguchi

Tetsuya Mino

Yoshitaka Sasaki

Yuji Ito

Atsushi Iijima

Shigeru Ichihara

Katsuya Kanakubo

Hiraku Hirabayashi

Junichi Sato

Takeo Kagami

Kazuo Ishizaki

Kiyoshi Noguchi

Hiroshi Kiyono

Shuichi Okawa

Hideaki Sato

Takamitsu Sakamoto

Nozomu Hachisuka

Taro Oike

Kazuya Maekawa

Yasufumi Uno

Eiichi Omata

Jun-ichi Hokushin

The present invention relates to a magnetic head and particularly to improvement of its recording element. The recording element includes a first magnetic film, a second magnetic film, a coil film, and an insulating film. The first magnetic film has a first pole portion. The second magnetic film has a second pole portion opposed to the first pole portion with a magnetic gap film therebetween and is joined to the first magnetic film at a back gap portion that is located in a rearward position with respect to a medium facing surface. The coil film extends around the back gap portion, and the insulating film encloses the coil film. Moreover, the second magnetic film entirely covers the insulating film.

Magnetic head, head assembly and magnetic recording/reproducing apparatus and method for manufacturing magnetic head

A multi-channel thin-film magnetic head includes a substrate, a plurality of thin-film magnetic head elements formed on the substrate, a closure fixed onto the plurality of thin-film magnetic head elements, a protection film laminated on a whole area of a TBS of the plurality of thin-film magnetic head elements and the closure, and many micro-grooves formed in a surface of the protection film.

Multi-channel thin-film magnetic head, magnetic tape drive apparatus with the multi-channel thin-film magnetic head and manufacturing method of multi-channel thin-film magnetic head

A composite thin-film magnetic head includes a substrate, an under layer formed on the substrate, an MR read head element formed on the under layer and provided with a lower shield layer, an upper shield layer and an MR layer in which a sense current flows in a direction perpendicular to a surface of the MR layer through the upper shield layer and the lower shield layer, an inter-shield insulation layer laminated on the MR read head element, an inductive write head element formed on the inter-shield insulation layer and provided with a first magnetic pole layer, a nonmagnetic layer, a second magnetic pole layer whose end portion is opposed to an end portion of the first magnetic pole layer through the nonmagnetic layer, and a write coil, and an additional shield layer formed between the upper shield layer and the first magnetic pole layer.

Composite thin-film magnetic head, magnetic head assembly and magnetic disk drive apparatus

A bottom pole layer and a top pole layer respectively incorporate pole portion layers. Cross sections of the pole portion layers and a gap layer parallel to the top surface of a substrate are of the same shapes. The aggregate of the pole portion layers and the gap layer includes a first portion having a width W that defines the track width, and a second portion having a width greater than the width W of the first portion. L/W falls within a range of 2 to 5 inclusive, where L is the distance from a medium facing surface to the interface between the first portion and the second portion. S/(W&#xd7;L) falls within a range of 5 to 40 inclusive, where S is the area of the cross section of the aggregate parallel to the top surface of the substrate.

Thin-film magnetic head with gap and pole portion layers having cross sections of the same shapes and predetermined parameter ranges

An electroplated magnetic thin film consisting of an electroplated film of Fe&#x2014;Co alloy containing Fe by an amount of 52&#x2013;86 wt % and having a highly packed fine crystal grain structure, a flat and glossy surface, a high saturation magnetic flux density not less than 2.1 T, a low coercive force of 5&#x2013;10 Oe, and being particularly suitable as a pole portion of a thin film magnetic head is proposed. The electroplated magnetic thin film is deposited on a substrate by an electroplating process with a pulsatory current or direct current having a current density of 3&#x2013;120 mA/cmwhile using an electroplating bath containing one or both of sulfate salt and hydrochloric salt serving as supply sources of Fe ions and Co ions, saccharin sodium serving as a stress relaxation agent by an amount not less than 1 g/l, boric acid as a pH buffer agent, ammonium chloride as an electrically conductivity salt, and sodium lauryl sulfate as a surfactant.

Electroplated magnetic thin film, method of manufacturing the same, electroplating bath and thin film magnetic head

A method of manufacturing a thin-film magnetic head allowing dimension control of the width of the magnetic pole and reduction of the time required for formation is provided. A layer of iron nitride formed by sputtering is selectively etched with the RIE to form a top pole tip. In this etching process with RIE, chlorine-type gas is selected as a gas seed for etching, and the process temperature is in a range of 50&#xb0; C. to 300&#xb0; C. Subsequently, using part of a first mask and a tip portion of the top pole tip as a mask, part of both the write gap layer and the second bottom pole are etched with the RIE similarly to the above process, to thereby form a magnetic pole. The etching conditions are optimized by performing the process with the RIE under the above conditions, so that both of the top pole tip and the magnetic pole can be formed with high precision, and that the time required for forming both of these elements can be significantly reduced.

Method of manufacturing thin film magnetic head

A top pole layer in a write head includes, in a pole portion, a first layer having surfaces one of which is adjacent to a write gap layer, a second layer having surfaces one of which is adjacent to the other surface of the first layer, and a third layer having surfaces one of which is adjacent to the other surface of the second layer. The first to third layers have different saturation flux densities such that the closer the layer to the write gap layer, the higher saturation flux density.

Thin-film magnetic head and method of manufacturing same

Soft magnetic thin film and thin film magnetic head using the same

A track width defining layer for defining a write track width of a thin-film magnetic head is made of a CoNiFe film formed through electroplating. The CoNiFe film contains 60 to 75 weight % cobalt, 10 to 20 weight % nickel, and 10 to 20 weight % iron, and has a crystal structure that is a mixture of a body-centered cubic structure phase and a face-centered cubic structure phase, in which Ib/If falls within the range of 0.3 to 0.7 inclusive where Ib represents the intensity of an X-ray diffracted from a (110)-plane of the body-centered cubic structure and If represents the intensity of an X-ray diffracted from a (111)-plane of the face-centered cubic structure. The pH of a plating bath for forming the CoNiFe film through electroplating is adjusted to 3.0 to 4.0 inclusive.

Cobalt-nickel-iron alloy thin film and method of forming the same, and thin-film magnetic head and method of manufacturing the same

A method of manufacturing a thin-film magnetic head allowing dimension control of the width of the magnetic pole and reduction of the time required for formation is provided. A layer of iron nitride formed by sputtering is selectively etched with the RIE to form a top pole tip. In this etching process with RIE, chlorine-type gas is selected as a gas seed for etching, and the process temperature is in a range of 50&deg; C. to 300&deg; C. Subsequently, using part of a first mask and a tip portion of the top pole tip as a mask, part of both the write gap layer and the second bottom pole are etched with the RIE similarly to the above process, to thereby form a magnetic pole. The etching conditions are optimized by performing the process with the RIE under the above conditions, so that both of the top pole tip and the magnetic pole can be formed with high precision, and that the time required for forming both of these elements can be significantly reduced.

In a method of forming a track width defining layer including a magnetic pole portion, a base film is initially formed on a write gap layer. The base film includes a first layer made of a magnetic material having a saturation magnetic flux density of 1.8 T or more, and a second layer formed on the first layer and made of a magnetic material. The magnetic material forming the second layer is a material containing Fe or Ni as a main component and without containing Co. Then, a frame having an opening of a shape matching with the track width defining layer is formed on the second layer. Subsequently, the track width defining layer is formed within the opening by electroplating, using the base film as an electrode.

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Tokyo, Japan

Seiji Yari