Kabushiki Kaisha Toshiba

Seiji Onoue

Hiroshi Nishimura

Makoto Saito

Shigeyuki Takagi

Ryuuichi Teramoto

Ichiro Tohno

A testing method includes: storing QC data for each of electronic device manufacturing processes in a storage unit; changing the QC data for each of the processes to a common fixed form of data; providing a contour for the QC data for each of the processes using the common fixed form of data; comparing a singularity map to a failure generation map for a completed device; and finding a causal process for a failure and a defect through the comparison.

Testing method and method for manufacturing an electronic device

A dry processing apparatus includes a lower electrode for holding a substrate to be processed in a chamber, a shower head, provided to face a surface of the lower electrode, on which the substrate to be processed is placed, for supplying a process gas to the substrate to be processed, placed on the lower electrode, and a pumping channel formed to surround an outer circumference of the lower electrode, wherein a pumping gap portion for communicating a processing space formed between the lower electrode and the shower head, and the pumping channel with each other, is made such that a width of the gap portion differs between an exhaust pump side where the pumping channel is connected to an exhaust pump, and an opposite side thereto.

Growing community of inventors

Yokohama, Japan

Seiji Onoue