Mitsubishi Electric Corporation

Other

Mitsubishi Denki Kabushiki Kaisha

Mitsubishi Electric R&d Centre Europe B.v.

Seiji Noda

Masaki Kuzumoto

Makoto Miyamoto

Izumi Oya

Tatsuo Kataoka

Yoshihiro Nakayama

Tadashi Saito

Nozomu Yasunaga

Seiji Furukawa

Masashi Ohmori

Tokiko Yamauchi

Yuki Sato

Kazutaka Suzuki

Kenro Mitsuda

Yasuhiro Tanimura

Kazuhiro Miya

Hideo Horibe

Eiji Imamura

Masaru Takada

Toshiyuki Kamiya

Hirokazu Minamisako

Yohei Ueno

Akane Nomura

Tetsuji Oishi

Kota Kurihara

Isamu Hirashiki

Takafumi Nakai

Aya Kawashima

Wataru Yoshida

Shigeru Iijima

Go Wakamatsu

Takushi Kawada

Kenta Shimoda

Ryuki Yoshida

This water treatment device includes: electrode units for performing adsorption/desorption of the impurity; a treatment tank having the electrode units disposed in an inside of the treatment tank; an upstream part for guiding the water into the inside; a downstream part for guiding the water so as to be discharged, the water having been subjected to the adsorption/desorption performed by the electrode units; a circulation pipeline, the circulation pipeline being for guiding water having been guided by the downstream part, to the upstream part; and a switching unit for switching between, on the basis of at least one of a water quality of the water having been guided to the downstream part or an electric state of the treatment tank, guiding the water having been guided by the downstream part, so as to be discharged, and guiding the water to the circulation pipeline.

Water treatment device

A water treatment plant which performs water treatment using a water treatment device includes an imaging device, a processing device, and a control device. The imaging device images a water treatment environment of the water treatment device and outputs image data obtained by imaging. The processing device causes an arithmetic device which performs an arithmetic operation using one or more calculation models generated by machine learning to execute the arithmetic operation employing the image data output from the imaging device as input data of the one or more calculation models. The control device controls the water treatment device on the basis of output information output from the arithmetic device by executing the arithmetic operation.

Water treatment plant and method for operating water treatment plant

An ion removal apparatus according to this disclosure performs a desalination treatment on a liquid and includes: a first electrode guide having an inlet allowing the liquid to flow in, a first electrode holder holding a first electrode that adsorbs an ion in the liquid, and an inflow passage serving as a flow passage connecting the inlet and the first electrode holder to one another; and a second electrode guide having an outlet allowing the liquid to flow out, a second electrode holder allowing the liquid passing through the first electrode holder to flow in and holding a second electrode that adsorbs the ion in the liquid, and an outflow passage serving as a flow passage connecting the outlet and the second electrode holder to one another.

Ion removal apparatus

Provided is a water treatment device configured to perform a deionization treatment for the water to be treated, and the water treatment device includes a pressing member, a treatment container configured to store the water to be treated, a first electrode and a second electrode accommodated in the treatment container, a separator arranged between the first electrode and the second electrode, and a pair of collectors, which are accommodated in the treatment container, and are configured to apply a voltage to the first electrode and the second electrode. The pressing member is configured to press the first electrode and the second electrode in the treatment container.

Water treatment device, water treatment system, method of assembling water treatment device, and water treatment method

A water treatment apparatus includes: a first granular electrode member and a second granular electrode member stored in a water treatment unit and provided so as to be separated from each other; a power supply unit which applies voltage between the first granular electrode member and the second granular electrode member so that ions contained in treatment target water supplied from one side of the water treatment unit are adsorbed to the first granular electrode member and the second granular electrode member; and a washing water supply pump which causes washing water to flow from the other side of the water treatment unit to the one side of the water treatment unit, thereby washing the first granular electrode member and the second granular electrode member, wherein the first granular electrode member and the second granular electrode member each include a plurality of flowable granular electrode members.

Water treatment apparatus and water treatment method

A scale trapping unit includes a casing having a water inlet and a water outlet at respective ends, and a scale adsorbing element loaded in the casing, the scale adsorbing element having opening ports, each of the opening ports having a representative length greater than a length of a scale particle. The casing has a void region at least at the end where the water inlet is located. A scale trapping unit inlet pipe is perpendicularly connected to a central portion of a bottom surface at the end of the casing where the water inlet is located. The scale trapping unit inlet pipe, the void region, and the scale adsorbing element are linearly aligned so that water flows therethrough in a constant direction.

Scale trapping unit and water heater

A humidifier obtains, based on detection values of a first and second temperature and humidity sensors, the amount of humidification, the amount of water evaporated by a humidifying material per preset time, controls the amount of water supplied by a water supply unit per the preset time to be smaller than a specific value when the amount of humidification obtained at the present time is increased compared to the amount of humidification obtained at the previous time, and controls the amount of water supplied by the water supply unit per the preset time to be equal to or greater than the specific value when the amount of humidification obtained at the present time is decreased compared to the amount of humidification obtained at the previous time or when the amount of humidification obtained at the present time is equal to the amount of humidification obtained at the previous time.

Humidifier and method of hydrophilization processing for humidifying material

A water heater, which allows efficient deposition of a scale component dissolved in water so as to reduce adhesion of the scale to a heat-transfer channel. The water heater includes: scale deposition device including a tank, an anode and a cathode provided in the tank so as to be opposed to each other, and a first power supply for applying a voltage between the anode and the cathode, the scale deposition device depositing a scale component dissolved in water retained in the tank; a heat-transfer channel provided at downstream of the scale deposition device, for guiding the water; and a heat source for heating the water by heat exchange in the heat-transfer channel, in which the scale deposition device includes oxygen-gas supplying/dissolving means for supplying an oxygen gas to a water feed pipe for feeding the water to the tank and dissolving the oxygen gas in the water.

Scale deposition device and water heater

A photoresist film removing apparatus includes a reacting chamber, an ozonizer producing a gas supplied to the reacting chamber, and an exhaust system that exhausts the gas from the reacting chamber. A source of a photoresist film-remover is located opposite a stage carrying a substrate covered with photoresist. Photoresist film-remover and the gas are supplied to the substrate through apertures. An electric field may be generated between the source of the photoresist film-remover and the substrate. Alternatively, a centrally located feed tube supplies only one of the gas and the photoresist film-remover through a single aperture and a reservoir discharges the other through apertures. The reservoir surrounds and is sealed to the feed tube. The apparatus may include a container holding a liquid photoresist film-remover and a mixture of the gas and remover is supplied from outside the reacting chamber to the substrate.

Apparatus for removing photoresist film

A substrate treatment apparatus includes a substrate heating device for maintaining a substrate at a temperature higher than room temperature, a wetting device for producing a wet ozone-containing gas by wetting an ozone-containing gas with a treatment solution, and a supply device for supplying the wet ozone-containing gas from the wetting device to a work object on a surface of the substrate. The supply device includes a gas disperser including apertures aligned in rows in a width direction of the work object. The apertures in adjacent rows are not aligned with each other in a direction perpendicular to the rows. At least one of the gas disperser and the substrate is movable in a direction perpendicular to the rows. A gas conduit connects the wetting device to the supply device. A wet ozone-containing gas heating device heats the wet ozone-containing gas to a temperature at least equal to the temperature of the substrate.

Substrate treatment apparatus

An apparatus for removing a photoresist film includes a substrate cassette for fixing a substrate having a surface covered with a photoresist film, an ozone feed tube for supplying ozone, a liquid feed tube for supplying a liquid photoresist film removing solution, and a processing tank for recovering and processing at least one of ozone and the liquid photoresist film removing solution, wherein the liquid photoresist film removing solution is supplied through the liquid feed tube as a liquid or mist, at least one of ozone and the photoresist film removing solution being continuously supplied.

A substrate treatment assembly for treating a work object on a surface of a substrate by supplying to the work object a wet ozone-containing gas wetted with a treatment solution includes a substrate heating device for maintaining a substrate at a temperature higher than room temperature, a wetting device for producing a wet ozone-containing gas by wetting an ozone-containing gas with a treatment solution, a supply device for supplying the wet ozone-containing gas to a work object on a surface of the substrate, a gas conduit connecting the wetting device to the supply device, and a heating device for heating the wet ozone-containing gas to a temperature approximately equal to or greater than the temperature of the substrate.

Substrate treatment method

A method of removing a photoresist film with high efficiency of removal and friendliness with the environment while reducing material consumption and cost for a ventilation facility, and an apparatus used for the method. The method of removing a photoresist film in a sealed system, includes supplying a photoresist film-removal mixture containing an ozonized gas and a photoresist film-remover to a photoresist film on a surface of a substrate through a photoresist film-remover supplier opposed to the photoresist film.

Method for removing photoresist film and apparatus used therefor

A method of removing photoresist film with high efficiency of removal and friendliness with the environment while reducing the material consumption and the cost for the ventilation facility, and an apparatus used for the method are provided. Particularly the present invention provides a method of removing a photoresist film provided on a surface of a substrate, comprising steps of in a sealed system, disposing the substrate surface having the photoresist film to contact with a photoresist film removing solution, making ozone exist in gas phase and/or solution phase in the vicinity of the liquid surface of the photoresist film removing solution, and changing a relative position between the surface of the substrate and the liquid surface of the solution to decompose or remove the photoresist film from the substarate, characterized in that the relative position is changed continuously or intermittently within a range between a position where a bottom edge of the substrate is present above the liquid surface of the solution, and another position where a top edge of the substrate is present below the liquid surface of the solution. The present invention also provides an apparatus used for the method.

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Chiyoda-ku, Japan

Seiji Noda