Seiko Instruments Inc

Sii Nanotechnology Inc.

Seiji Morita

Akira Yonezawa

Mitsuyoshi Sato

Takashi Ogawa

Atsushi Uemoto

Mitsuyoshi Satou

In an image noise prevention method in a composite system of a scanning electron microscope (SEM) and a focused ion beam apparatus (FIB), noise generated during a blanking period of the FIB is prevented from entering an image generated by the SEM by adjustment of scanning cycles of the FIB and the SEM.

Image noise removing method in FIB/SEM complex apparatus

In order to ensure that an electromagnetic field lens is capable of high-resolution observation using a magnetic field lens without leakage of magnetic flux, there is provided a magnetic field superimposing-type lens for focusing an electron beam onto a sample so as to irradiate the sample is provided with an upper magnetic pole a long way from the sample and a lower side magnetic pole close to the sample , with electrical insulation being provided between the upper magnetic pole and the lower magnetic pole by a ferrite insulator provided between the upper magnetic pole and the lower magnetic pole in an integral manner with the magnetic poles so that the upper magnetic pole and the lower magnetic pole may be held at different potentials. There is therefore no leak in flux from between the upper magnetic pole and the lower-magnetic pole , the chromatic aberration coefficient Cc can be made small, and high-resolution observation of the sample can be achieved.

Electron beam apparatus

A scanning electron microscope equipped with a laser defect detection function has an automatic focusing function that performs the steps of: obtaining a deviation (offset) amount between focal positions of an optical microscope and a scanning electron microscope; detecting a defect by a laser dark-field image of the optical microscope; analyzing the dark-field image to readjust a focus of the optical microscope to adjust a height of the optical microscope; and automatically adjusting a focus of the scanning electron microscope by adding a readjusted amount of the focus of the optical microscope to the offset amount before an observation is conducted by the scanning electron microscope.

Automatic focusing system for scanning electron microscope equipped with laser defect detection function

The invention is to observe semiconductor wafers with higher resolution at a low acceleration voltage&mdash;in particular, achieving such high-resolution observability when a wafer is inclined or tilted at large angles. A composite lens is used which consists essentially of a single-pole or monopole magnetic field type lens and an electrostatic field invasive lens whereas an electrode of the electrostatic field invasive lens which opposes the wafer is made of a magnetic material while letting a high voltage of the negative polarity be applied to this electrode and the wafer. Even when the wafer is tilted, any astigmatism and axis failure will hardly occur.

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Chiba, Japan

Seiji Morita