Mitsubishi Paper Mills Limited

Seiichi Sumi

Yoshio Shibata

Kunihiro Nakagawa

Eiichi Terashima

Akira Furukawa

Toshiro Kondo

Kazuhisa Kobayashi

Kenichi Nishi

Katsuaki Iwaosa

Hideaki Baba

Sukeaki Date

Tamotu Iwata

Masao Okushima

Eiji Matsubara

Shoji Akaiwa

Disclosed is a silver halide photographic photosensitive material comprising a support and, provided thereon, at least one hydrophilic colloid layer including a photosensitive layer wherein the photosensitive layer comprises monodispersed silver halide grains having an average grain size of 0.2 micron or less and comprising at least 90 mol % of silver chloride, the photosensitive layer or a hydrophilic colloid layer provided on the same side of the support as the side on which the photosensitive layer is provided contains a hydrazine derivative, a hydrophilic colloid layer provided above the photosensitive layer contains a water-dispersible fine particle polymer, the photosensitive layer contains substantially no water-dispersible fine particle polymer, and amount of the water-dispersible fine particle polymer contained in the hydrophilic colloid layer is 1 g/m.sup.2 or less and is 5% by weight or more based on the weight of gelatin contained in the hydrophilic colloid layer.

Silver halide photographic photosensitive material

The present invention provides a silver halide photographic photosensitive material which comprises a transparent support and a silver halide emulsion photosensitive layer provided thereon and a non-photosensitive layer on another side of the support on which the photosensitive layer is not provided, wherein both the photosensitive layer and the non-photosensitive layer contain dyes respectively and transmission density at 350-400 nm of the dye in the photosensitive layer is 0.15 or less and transmission density at 350-400 nm of the dye in the non-photosensitive layer is 0.40 or more.

The present invention provides a developer for silver halide photographic light-sensitive materials which provides super-high contrast and is improved in stability with time. This developer contains at least (1) a developing agent, (2) 10 g/l or more of a hydroquinonemonosulfonate, (3) 0.3 mol/l or more of a sulfite and (4) an amino compound in an amount necessary to accelerate enhancement of contrast and has a pH of 10.5-12.3.

Method for photographic development

Disclosed is a developer for silver halide photographic light-sensitive material which contains at least one of the compounds represented by the following formulas [I], [II] and [III]: Formula [I]: ##STR1## wherein M represents a hydrogen atom, an alkali metal or NH.sub.4 and A and B each represents a mercapto group, a hydroxyl group, a hydroxyalkyl group, or ##STR2## wherein R.sub.1 and R.sub.2 each represents a hydrogen atom or --X--Y group in which X represents a divalent group and Y represents a carboxyl group or a hydroxyl group, Formula [II]: ##STR3## wherein M represents a hydrogen atom, an alkali metal or NH.sub.4, A' represents an organic divalent group, and B' represents --SO.sub.3 M', --COOM', --SO.sub.2 NHR.sub.3, --CONHR.sub.3, or --OH wherein M' represents a hydrogen atom, an alkali metal atom or NH.sub.4, and R.sub.3 represents a hydrogen atom or an alkyl group of 1-3 carbon atoms, and Formula [III]: ##STR4## wherein M and B' are the same as defined in the above formula [II]:

Developer for silver halide photographic light-sensitive material

The present invention provides a silver halide light-sensitive film material having a backcoat layer which is sufficiently subjected to antistatic treatment. This material has an electrically conductive polymer layer comprising a copolymer of N-methylol(meth)acrylamide and styrenesulfonic acid as an antistatic layer between a film base and the backcoat layer.

Silver halide light-sensitive film material subjected to antistatic

The present invention provides a siliver halide photographic photosensitive material which comprises a base, at least a silver halide emulsion layer provided on the base and at least a back coat layer comprising a gelatin containing a polymer mainly composed of styrenesulfonic acid provided on another side of the base wherein said back coat layer additionally contains a surface active agent represented by the following formula [I] and is hardened with a triazine. ##STR1## whererin n is a natural number of 1-20, M represents a hydrogen atom or an alkali metal, and R represents an alkyl group of 5-15 carbon atoms, or ##STR2## in which R.sub.1 represents an alkyl group of 5-15 carbon atoms and R.sub.2 represents an alkyl group of 1-3 carbon atoms, a hydrogen atom or a halogen atom. Said back coat layer is excellent in antistatic properties, adhesion to a base and drying properties.

Antistatically finished silver halide photographic photosensitive

The present invention provides a silver halide photographic photosensitive material excellent in dimensional stability which comprises a polyethylene terephthalate film support and, provided thereon, at least one gelatin layer containing an active halogen type hardener, wherein water content in the gelatin layer is 20% by weight or less based on total amount of gelatin. Further provided is a method for producing such silver halide photographic photosensitive material which comprises coating a gelatin coating solution containing an active halogen type hardener on a polyethylene terephthalate film support and then drying the coat, wherein the coat is dried so that water content based on total amount of gelatin is 20% by weight or less and then, is subjected to a heat treatment.

Disclosed is a negative fine grain silver halide photographic emulsion capable of afford hard tone and high D.sub.max and have a markedly higher sensitivity than convertional roomlight handlable light-sensitive materials and free from defects such as fogging and decrease in sensitivity under roomlight conditions. This emulsion contains at least 70 mol % of silver chloride and an organic desensitizer which has an anodic polarographic potential and a cathodic polarographic potential which when added together give a positive sum, the amount of said organic desensitizer being such that necessary to reduce the sensitivity of said emulsion by not more than log E=1.3 (log E=1.0 in the case of silver chloride). This emulsion may further contain a rhodium salt.

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Nagaokakyo, Japan

Seiichi Sumi