Mitsui Petrochemical Industries, Ltd.

Mitsui Chemicals, Inc.

Seiichi Ikeyama

Toshiyuki Tsutsui

Akira Todo

Mamoru Takahashi

Shinya Matsunaga

Norio Kaneshige

Hideki Sakai

Mamoru Kioka

Takashi Ueda

Hajime Inagaki

Masaki Kohyama

Yoshinori Akana

Masaya Yamada

Seiji Ohta

Kenji Iwata

Kazumitsu Kawakita

Tsuneo Yashiki

Hiroshi Nishikawa

Satoshi Matsumoto

An ethylene copolymer composition comprising an ethylene/&#x3b1;-olefin copolymer, A-4, of ethylene with an &#x3b1;-olefin of 3 to 20 carbon atoms in an amount of 65-98% by weight, whose melt tension, MT, at 190&#xb0; C. and MFR satisfy the relation MT&#x3e;2.2&#xd7;MFR, and at least one crystalline polyolefin, B-2, in an amount of 1-40% by weight selected from the group consisting of, B-I, an ethylene homopolymer or a copolymer of ethylene with an &#x3b1;-olefin of 3 to 20 carbon atoms, prepared using a non-metallocene type catalyst, B-II, a propylene hompolymer or a copolymer of propylene with at least one olefin selected from ethylene and an &#x3b1;-olefin of 4 to 20 carbon atoms, and, B-III, a homopolymer of an &#x3b1;-olefin of 4 to 20 carbon atoms or a copolymer of &#x3b1;-olefins of 4 to 20 carbon atoms, and articles made from the composition.

Ethylene copolymer composition

An ethylene copolymer composition comprising an ethylene/&agr;-olefin copolymer (A-1), which has a density, a melt flow rate (MFR), an amount of a n-decane-soluble portion in the specific ranges and whose melt tension (MT) at 190&deg; C. and MFR satisfy the relation MT>2.2&times;MFR , and one (co)polymer selected from the group consisting of (B-1) a low-density polyethylene obtained by high-pressure radical polymerization, (B-2) a crystalline polyolefin and (B-3) an olefin type elastomer. Also disclosed is an ethylene copolymer composition comprising an ethylene/&agr;-olefin copolymer composition and the low-density polyethylene (B-1) obtained by high-pressure radical polymerization, said ethylene/&agr;-olefin copolymer (A-2) and (A-3) both having physical properties similar to those of the above ethylene/&agr;-olefin copolymer (A-1) and having intrinsic viscosities different from each other. The ethylene copolymer compositions of the invention are excellent in heat stability and moldability, and able to form films of high transparency, high mechanical strength and anti-blocking resistance.

Ethylene/&agr;-olefin copolymer with olefin type elastomer, each having particular properties, including density and melt flow rate, with a density ratio of elastomer to copolymer of less than 1, provide compostions which have excellent moldability and form films having high mechanical strength.

An ethylene copolymer composition comprising an ethylene/&agr;-olefin copolymer &lsqb;A1&rsqb; obtained by using a catalyst for olefin polymerization containing an organoaluminum oxy-compound (a) and at least two kinds of specific metallocene compounds (b), and one (co)polymer selected from the group consisting of &lsqb;B1&rsqb; a low-density polyethylene obtained by high-pressure radical polymerization, &lsqb;B2&rsqb; a crystalline polyolefin and &lsqb;B3&rsqb; an olefin type elastomer. An ethylene copolymer composition comprising an ethylene/&agr;-olefin copolymer &lsqb;A2&rsqb; having specific properties, and one (co)polymer selected from the group consisting of &lsqb;B1&rsqb; a low-density polyethylene obtained by high-pressure radical polymerization, &lsqb;B2&rsqb; a crystalline polyolefin and &lsqb;B3&rsqb; an olefin type elastomer.

A thermal fixing developer material for electrophotography is provided. This developer material is adapted for use as a main component of an electrostatic toner, and the toner produced by using this developer material exhibits excellent release properties upon thermal fixing, and in particular, upon thermal fixing at low temperature, and therefore, is free from offset and contamination of carrier, photosensitive material, heat roller, and the like. Such a toner is also provided with high blocking resistance. The developer material of this invention comprises a wax of a propylene-based copolymer having a particular molecular weight, a particular melting point, and a particular compositional distribution.

Thermal fixing developer material and wax for electrophotography

Ethylene copolymer compositions comprise: an ethylene/.alpha.-olefin copolymer component comprising at least one ethylene/.alpha.-olefin copolymer having a density within a specific range, a melt flow rate (MFR) within a specific range, an amount of an n-decane-soluble portion within a specific range and a melt tension (MT) that satisfies a specific relation with the MFR; and a (co)polymer component comprising one (co)polymer selected from the group consisting of a low-density polyethylene obtained by high-pressure radical polymerization, a crystalline polyolefin and an olefin elastomer. The ethylene copolymer compositions are excellent in heat stability and moldability, and able to form films of high transparency, high mechanical strength and anti-blocking resistance.

An ethylene copolymer composition comprising an ethylene/.alpha.-olefin copolymer obtained by using a catalyst for olefin polymerization containing an organoaluminum oxy-compound (a) and at least two kinds of specific metallocene compounds (b), and a low-density polyethylene obtained by high-pressure radical polymerization. The ethylene/.alpha.-olefin copolymer compositions of the invention are excellent in moldability. From these copolymer compositions, films having high transparency and high mechanical strength can be produced.

An ethylene copolymer composition comprising an ethylene/.alpha.-olefin copolymer [A-I] which has a density, a melt flow rate (MFR), an amount of a n-decane-soluble portion in the specific ranges and whose melt tension (MT) at 190.degree. C. and MFR satisfy the relation MT&gt;2.2.times.MFR.sup.-0.84 and one (co)polymer selected from the group consisting of [B-1] a low-density polyethylene obtained by high-pressure radical polymerization, [B-2] a crystalline polyolefin and [B-3] an olefin type elastomer. Also disclosed is an ethylene copolymer composition comprising an ethylene/.alpha.-olefin copolymer composition and the low-density polyethylene [B-1] obtained by high-pressure radical polymerization, said ethylene/.alpha.-olefin copolymer composition comprising ethylene/.alpha.-olefin copolymers [A-2] and [A-3] both having physical properties similar to those of the above ethylene/.alpha.-olefin copolymer [A-1] and having intrinsic viscosities different from each other. Further disclosed is an ethylene copolymer composition comprising an ethylene/.alpha.-olefin copolymer [A-4] which has a density, a melt flow rate (MFR), a weight of a n-decane-soluble portion in the specific ranges and whose melt tension (MT) at 190.degree. C. and MFR satisfy the relation MT&lt;2.2.times.MFR.sup.-0.84, and one (co)polymer selected from the above group consisting of [B-1], [B-2] and [B-3]. Still further disclosed is an ethylene copolymer composition comprising an ethylene/.alpha.-olefin copolymer composition and a low-density polyethylene [B-4] obtained by high-pressure radical polymerization, said ethylene/.alpha.-olefin copolymer composition comprising ethylene/.alpha.-olefin copolymers [A-5] and [A-6] both having physical properties similar to those of the above ethylene/.alpha.-olefin copolymer [A-4] and having intrinsic viscosities different from each other. The ethylene copolymer compositions of the invention are excellent in heat stability and moldability, and able to form films of high transparency, high mechanical strength and anti-blocking resistance.

The present invention provides an ethylene/.alpha.-olefin copolymer comprising constituent units (a) derived from ethylene and constituent units (b) derived from an .alpha.-olefin having 3 to 20 carbon atoms, the ethylene copolymer being characterized in that

Ethylene/alpha-olefin copolymer

The present invention relates to a novel ethylene/pentene-1 copolymer whose molded film has a good balance between impact resistance and tear properties and high transparency, also is prominently reduced in a variation of the transparency even after subjected to a heat treatment, and further shows high blocking resistance, provided that the copolymer fulfills specific requisites. The invention also relates to a process for the preparation of the above-mentioned ethylene/pentene-1 copolymer and a formulation of the ethylene/pentene-1 copolymer composition using a stabilizer. According to the invention, there can be obtained an ethylene/pentene-1 copolymer composition which is excellent in heat stability in the molding stage, long-term heat stability and weatherability.

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Waki-cho, Japan

Seiichi Ikeyama