Rigaku Corporation

Komatsu Corporation

Komatsu Industries Corporation

The Furukawa Electric Co., Ltd.

Hitachi, Ltd.

Seiichi Hayashi

Jimpei Harada

Kazuhiko Omote

Tetsuo Kikuchi

Masaru Kuribayashi

Hideyuki Nakamura

Toshihiro Koide

Kanji Tanaka

Akira Fujisaki

Katsuhiko Inaba

Sadayuki Takahashi

Naohisa Osaka

Koji Kajiwara

Taizo Miyato

Koji Masauji

Masahiko Okubo

There is provided a power control method for a fiber laser processing machine including: a fiber laser oscillator having a plurality of fiber laser modules each of which generates a laser beam; a laser processing head for emitting the laser beam generated from the fiber laser oscillator; and a condenser lens with a prescribed focal length provided between a workpiece and the laser processing head, for irradiating the workpiece with the laser beam having a spot diameter output from the laser processing head, wherein the number of the plurality of fiber laser modules oscillated is adjusted so as to achieve the spot diameter corresponding to the workpiece, and thereby, a beam quality from the laser processing head is adjusted.

Power control method for fiber laser processing machine, and fiber laser processing machine

A laser device includes an optical fiber laser unit including an amplification optical fiber, a plurality of pumping light sources outputting pumping lights for optically pumping the amplification optical fiber, and a controller controlling the pumping light sources. When an instruction value for supplying a predetermined driving electric current to each of the pumping light sources is input to the controller, the controller conducts a control of supplying a compensated electric current value as a driving electric current obtained by multiplying an initial electric current value corresponding to the instruction value by a compensation coefficient and supplying the compensated electric current value to each of the pumping light sources. The compensation coefficient is set to restrain a decrease in a power with time of a laser light output from the optical fiber laser unit.

Laser device

Laser processing machine

The thin film deposition system for depositing a thin film on the surface of substrates disposed in a sealed thin film deposition furnace comprises a measuring unit at a site communicating with the thin film deposition furnace, the measuring unit comprising a thin film deposition sample substrate for allowing a thin film substance flowing in from the thin film deposition furnace to adhere while X-ray incidence and extraction windows being provided on the side walls of the measuring unit, wherein X-ray is irradiated on the thin film deposition sample substrate in the measuring unit through the X-ray incidence window by means of a thin film measuring unit provided at the outside of the thin film deposition furnace, and the X-ray reflected from the thin film deposition sample substrate is sensed through the X-ray extraction window.

Method and apparatus for measuring thin film, and thin film deposition system

Apparatus for X-ray analysis has a combination of a rotating target X-ray tube and a composite monochromator. The composite monochromator has a first and a second elliptic monochromators joined with each other side by side. Each of the elliptic monochromators has a first focal point at which an X-ray focal spot on a target of the X-ray tube is disposed. Each of the elliptic monochromators has a synthetic multilayered thin film whose d-spacing varies continuously along an elliptic-arc. The shortest distance between the X-ray focal spot and the composite monochromator is set to 40 to 100 mm. Under the shortest distance condition, the effective focal spot size on the target is set to 40 to 100 micrometers to obtain the maximum X-ray intensity on a sample to be analyzed.

Apparatus for X-ray analysis and apparatus for supplying X-rays

An X-ray generator includes a hermetically sealed main generator unit, and an electron gun and a target housed inside the main generator unit, and bombards the target with electrons emitted from the electron gun and passes an X-ray beam emitted from the surface of the target owing to the bombardment to the exterior through an exit window. An X-ray optical element is provided inside the main generator unit on the output path of the X-ray beam emitted from the target for regulating the X-ray beam and the X-ray beam regulated by the X-ray optical element is passed through the exit window. This configuration improves the durability of the X-ray optical element and enables the length of the X-ray path to the X-ray irradiation point to be shortened so as to suppress attenuation of the emitted X-ray beam by air resistance and thereby reduce power consumption.

X-ray generator

An incident monochromator and a microfocus X-ray source with an apparent focal spot size of less than 30 micrometers are combined so that the X-ray source can be close to the monochromator and the intensity of X-rays focused on a sample is greatly increased. A side-by-side composite monochromator is arranged between the X-ray source and the sample. The composite monochromator has a first and a second elliptic monochromators each having a synthetic multilayered thin film with graded d-spacing. The first elliptic monochromator has one side which is connected to one side of the second elliptic monochromator. A preferable apparent focal spot size D of the X-ray source may be 10 micrometers. Because the invention provides a high focusing efficiency for X-rays, it is not required to use a high-power X-ray tube. The X-ray tube according to the invention, moreover, may have a stationary-anode, whose power may be about 7 Watts.

Apparatus for x-ray analysis

Growing community of inventors

Tokyo, Japan

Seiichi Hayashi