Rigaku Corporation

Sei Yoshihara

Kazuhiko Omote

Kiyoshi Ogata

Hiroshi Motono

Yoshiyasu Ito

Shigematsu Asano

Katsutaka Horada

Naoki Matsushima

Hideaki Takahashi

Shiro Umegaki

Sensui Yasuda

Akifusa Higuchi

Takao Kinefuchi

Ryotaro Yamaguchi

Licai Jiang

Shuichi Kato

Boris Verman

Asao Nakano

Naoki Kawahara

Makoto Kambe

Muneo Yoshida

A transmission type small-angle scattering device of the present invention includes a goniometerincluding a rotation arm. The rotation armis freely turnable around a θ-axis extending in a horizontal direction from an origin with a vertical arrangement state of the rotation armbeing defined as the origin, and has a vertical arrangement structure in which an X-ray irradiation unitis installed on a lower-side end portion of the rotation arm, and a two-dimensional X-ray detectoris installed on an upper-side end portion of the rotation armto form a vertical arrangement structure.

Transmissive small-angle scattering device

A transmission type small-angle scattering device of the present invention includes a goniometerincluding a rotation arm. The rotation armis freely turnable around a &#x3b8;-axis extending in a horizontal direction from an origin with a vertical arrangement state of the rotation arm being defined as the origin, and has a vertical arrangement structure in which an X-ray irradiation unitis installed on a lower-side end portion of the rotation arm, and a two-dimensional X-ray detectoris installed on an upper-side end portion of the rotation armto form a vertical arrangement structure.

This fluorescent X-ray analysis apparatus is provided with an X-ray irradiation unitfor irradiating a sample S with: X-rays, having an energy that exceeds the energy absorption edge value of Ag which is selected as a measurement target element, and that is no greater than the energy absorption edge value of Sn which is an adjacent element having a higher energy absorption edge value than Ag; and X-rays having an energy exceeding the energy absorption edge value of Sn which is selected as a measurement target element.

Fluorescent X-ray analysis apparatus comprising a plurality of X-ray detectors and an X-ray irradiation unit including a multi-wavelength mirror

An X-ray inspection device of the present invention includes a sample placement unitfor placing a sample as an inspection target therein, a sample placement unit positioning mechanismfor moving the sample placement unit, a goniometerincluding first and second rotation membersthat rotate independently of each other, an X-ray irradiation unitinstalled on the first rotation member, and a two-dimensional X-ray detectorinstalled on the second rotation member. The sample placement unit positioning mechanismincludes a &#x3c7; rotation mechanismfor rotating the sample placement unitand a &#x3d5;-axis about a &#x3c7;-axis that is orthogonal to a &#x3b8;s-axis and a &#x3b8;d-axis at a measurement point P and extends horizontally.

X-ray inspection device

In an X-ray inspection device according to the present invention, an X-ray irradiation unitincludes a first X-ray optical elementfor focusing characteristic X-rays in a vertical direction, and a second X-ray optical elementfor focusing the characteristic X-rays in a horizontal direction. The first X-ray optical elementis constituted by a crystal material having high crystallinity. The second X-ray optical element includes a multilayer mirror.

X-ray inspecting device, X-ray thin film inspecting method, and method for measuring rocking curve

An X-ray thin film inspection device of the present invention includes an X-ray irradiation unitinstalled on a first rotation arm, an X-ray detectorinstalled on a second rotation arm, and a fluorescence X-ray detectorfor detecting fluorescence X-rays generated from an inspection target upon irradiation of X-rays. The X-ray irradiation unitincludes an X-ray optical elementcomprising a confocal mirror for receiving X-rays radiated from an X-ray tube, reflects plural focused X-ray beams monochromatized at a specific wavelength and focuses the plural focused X-ray beams to a preset focal point, and a slit mechanismfor passing therethrough any number of focused X-ray beams out of the plural focused X-ray beams reflected from the X-ray optical element

X-ray thin film inspection device

Growing community of inventors

Saitama, Japan

Sei Yoshihara