Nissin Ion Equipment Co., Ltd.

Sei Umisedo

Nariaki Hamamoto

Hideki Fujita

Tadashi Ikejiri

Kohei Tanaka

A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber, the cathode holder positioned such that a surface thereof opposes or surrounds a side surface of a cathode. The cathode is held in the cathode holder so that a front surface of the cathode will be positioned on the same plane as, outward from, or inward from the inner wall surface. In the cathode holder is provided a tubular first heat shield surrounding the cathode with a space provided between the first heat shield and the cathode, a surface of the first heat shield positioned to oppose or surround the side surface of the cathode. At a rear end of the cathode is provided a filament. The gap between the cathode holder and the plasma generating chamber is filled with an electrical insulating material.

Ion source

A change of a beam current of an ion beam which passes an outside of the side of a forestage beam restricting shutter, and which is incident on a forestage multipoints Faraday is measured while the forestage beam restricting shutter is driven in a y direction by a forestage shutter driving apparatus in order to obtain a beam current density distribution in the y direction of the ion beam at a position of the forestage beam restricting shutter. A change of a beam current of the ion beam which passes an outside of the side of a poststage beam restricting shutter, and which is incident on a poststage multipoints Faraday is measured while the poststage beam restricting shutter is driven in the y direction by a poststage shutter driving apparatus in order to obtain a beam current density distribution in the y direction of the ion beam at a position of the poststage beam restricting shutter. By using these results, an angle deviation, a diverging angle, and/or a beam size in the y direction of the ion beam can be obtained.

Ion beam measuring method and ion implanting apparatus

A beam current density distribution in y direction of an ion beamat a position of a forestage beam restricting shutteris measured by measuring a change in a beam current of the ion beamincident on a forestage multipoint Faradayby passing an outer side of a sideof the shutterwhile driving the forestage beam restricting shutterin y direction by a forestage shutter driving apparatus. Further, a beam current density distribution in y direction of the ion beamat a position of a poststage beam restricting shutteris measured by measuring a change in the beam current of the ion beamincident on a poststage multipoints Faradayby passing an outer side of a sideof the shutterwhile driving the poststage beam restricting shutterin y direction by a poststage shutter driving apparatus. Further, at least one of an angle deviation, a diverging angle and abeam side in y direction of the ion beamis measured by using a result of the measurement.

A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber with a tip of the cathode holder positioned outward from an inner wall surface of the plasma generating chamber. The cathode is held in the cathode holder so that a front surface of the cathode will be positioned outward from the inner wall surface. In the cathode holder is provided a tubular first heat shield surrounding the cathode with a space provided between the first heat shield and the cathode, the tip of the first heat shield positioned outward from the inner wall surface. At a rear side of the cathode is provided a filament. The gap between the cathode holder and the plasma generating chamber is filled with an electrical insulating material.

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Kyoto, Japan

Sei Umisedo