Soitec

Sebastien Mougel

Oleg Kononchuk

Didier Landru

Carole David

Christophe Gourdel

Xavier Schneider

Didier Masselin

A process comprises the following steps: a) provision of a chamber suitable for receiving a plurality of structures, b) circulation of a gas stream in the chamber so that the chamber has a non-oxidizing atmosphere, c) heat treatment of the plurality of structures at a temperature above a threshold value above which the oxygen present in an oxide of a dielectric diffuses through an active layer reacts with semiconductor material of the active layer and produces a volatile material, the process being noteworthy in that the step b) is carried out so that the gas stream has a rate of circulation between the plurality of structures greater than the rate of diffusion of the volatile material into the gas stream.

Process for manufacturing a plurality of structures

A calibration method for determining temperature set point corrections to be applied to the nominal temperature set points of each of the N heating zones of a heat treatment unit having L substrate locations, includes the following steps: establishing a sensitivity model linking variations of a substrate characteristic at each of M representative locations of the L locations to temperature set point variations applied in each of the N heating zones, the variations respectively reflecting differences with respect to a target characteristic and with respect to the nominal set points; executing the process in the heat treatment unit and on the basis of nominal set points; measuring the substrate characteristic at least at a representative measurement location of each heating zone of the unit to supply M measurements; and determining temperature set point corrections from the sensitivity model, the measurements and the target substrate characteristic.

Calibration method for heat treatment units

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Saint Martin d'Heres, France

Sebastien Mougel