3m Innovative Properties Company

Sebastian F Zehentmaier

Moses Mekala David

Jayshree Seth

Ta-Hua Yu

Klaus Hintzer

William Ward Merrill

Timothy J Hebrink

Matthew B Johnson

Richard C Allen

Malte Korten

Gallus Schechner

Carsten Franke

Kevin M Hamer

Ludwig Mayer

Michael C Dadalas

Michael S Berger

Joan M Strobel

Bernd Gangnus

Daniel S Bates

Fred J Roska

Steven J Rhyner

Xuan Jiang

Jeffrey N Bartow

Andreas M Geldmacher

Per Miles Nelson

Fee Zentis

Gabriele H Gottschalk-Gaudig

John M Klaeser

Provided are method of producing a shaped fluoropolymer articles. The methods include subjecting a composition comprising a fluoropolymer to additive processing in an additive processing device. Also provided are articles obtained with the methods and 3D-printable compositions.

Additive processing of fluoropolymers

A method of making a nanostructure and nanostructured articles by depositing a layer to a major surface of a substrate by plasma chemical vapor deposition from a gaseous mixture while substantially simultaneously etching the surface with a reactive species. The method includes providing a substrate; mixing a first gaseous species capable of depositing a layer onto the substrate when formed into a plasma, with a second gaseous species capable of etching the substrate when formed into a plasma, thereby forming a gaseous mixture; forming the gaseous mixture into a plasma; and exposing a surface of the substrate to the plasma, wherein the surface is etched and a layer is deposited on at least a portion of the etched surface substantially simultaneously, thereby forming the nanostructure. The substrate can be a (co)polymeric material, an inorganic material, an alloy, a solid solution, or a combination thereof. The deposited layer can include the reaction product of plasma chemical vapor deposition using a reactant gas comprising a compound selected from the group consisting of organosilicon compounds, metal alkyl compounds, meal isopropoxide compounds, metal acetylacetonate compounds, metal halide compounds, and combinations thereof. Nanostructures of high aspect ratio and optionally with random dimensions in at least one dimension and preferably in three orthogonal dimensions can be prepared.

Method of making a nanostructure and nanostructured articles

A method of making a nanostructure and nanostructured articles by depositing a layer to a major surface of a substrate by plasma chemical vapor deposition from a gaseous mixture while substantially simultaneously etching the surface with a reactive species. The method includes providing a substrate; mixing a first gaseous species capable of depositing a layer onto the substrate when formed into a plasma, with a second gaseous species capable of etching the substrate when formed into a plasma, thereby forming a gaseous mixture; forming the gaseous mixture into a plasma; and exposing a surface of the substrate to the plasma, wherein the surface is etched and a layer is deposited on at least a portion of the etched surface substantially simultaneously, thereby forming the nanostructure. The substrate can be a (co)polymeric material, an inorganic material, an alloy, a solid solution, or a combination thereof. The deposited layer can include the reaction product of plasma chemical vapor deposition using a reactant gas comprising a compound selected from the group consisting of organosilicon compounds, metal alkyl compounds, metal isopropoxide compounds, metal acetylacetonate compounds, metal halide compounds, and combinations thereof. Nanostructures of high aspect ratio and optionally with random dimensions in at least one dimension and preferably in three orthogonal dimensions can be prepared.

A process for making an optical film includes stretching a polyolefin film in a first direction and stretching the polyolefin film in a second direction different than the first direction forming a biaxially stretched polyolefin film. At least a portion of the stretching of the polyolefin film in the second direction occurs simultaneous with the stretching of the polyolefin film in the first direction. The biaxially stretched polyolefin film has a length and a width and substantially non-absorbing and non-scattering for at least one polarization state of visible light. The biaxially stretched polyolefin film has x, y, and z orthogonal indices of refraction where at least two of the orthogonal indices of refraction are not equal, an in-plane retardance being 100 nm or less and an out-of-plane retardance being 50 nm or greater.

Process for manufacturing polymeric optical film

Growing community of inventors

Obing, Germany

Sebastian F Zehentmaier