Asml Netherlands B.v.

Sebastiaan Smit

Engelbertus Antonius Fransiscus Van Der Pasch

Andre Bernardus Jeunink

Willem Herman Gertruda Anna Koenen

Frank Auer

Johannes Mathias Theodorus Antonius Adriaens

Suzanne Johanna Antonetta Geertruda Cosijns

Albert Johannes Maria Jansen

Peterjan Broomans

Joris Wilhelmus Henricus Vermunt

A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.

Substrate positioning system, lithographic apparatus and device manufacturing method

Growing community of inventors

Utrecht, Netherlands

Sebastiaan Smit