Exogenesis Corporation

Other

Epion Corporation

Tel Epion Corporation

Exogensis Corporation

Chau, Son

Kirkpatrick, Sean, R.

Sean R Kirkpatrick

Richard C Svrluga

Allen R Kirkpatrick

Joseph B Khoury

Laurence B Tarrant

Michael J Walsh

Stephen M Blinn

Barry M Zide

Kiet A Chau

Son T Chau

John J Hautala

Rangarajan Jagannathan

Martin D Tabat

Wesley J Skinner

William L Snell

John O Borland

Thomas G Tetreault

Vincent DiFilippo

Thy Yam

James G Bachand

Joseph Khoury

Kshama J Doshi

Son Chau

A method for removing amorphous regions from a surface of a crystal substrate uses an accelerated neutral beam including reactive gas species for removing or reactively modifying material surfaces without sputtering. Accelerated neutral atom beam enabled surface reactions remove surface contaminants from substrate surfaces to create an interface region with exposed crystal lattice in preparation for next phase processing.

Method and apparatus for forming substrate surfaces with exposed crystal lattice using accelerated neutral atom beam

A method for preparing a biological material for implanting provides irradiating at least a portion of the surface of the material with an accelerated Neutral Beam.

Method for modifying the wettability and/or other biocompatibility characteristics of a surface of a biological material by the application of gas cluster ion beam technology and biological materials made thereby

A method of processing a trench, via, hole, recess, void, or other feature that extends a depth into a substrate to a base or bottom and has an opening by irradiation with an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials at the base or bottom of the opening.

Method and apparatus for neutral beam processing based on gas cluster ion beam technology

An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials.

A method for shallow etching a substrate surface forms a shallow modified substrate layer overlying unmodified substrate using an accelerated neutral beam and etches the modified layer, stopping at the unmodified substrate beneath, producing controlled shallow etched substrate surfaces.

Method for ultra-shallow etching using neutral beam processing based on gas cluster ion beam technology

A device such as a medical device and a method for making same provides a surface modified by beam irradiation, such as a gas cluster ion beams or a neutral beam, to inhibit or delay attachment or activation or clotting of platelets.

Treatment method for inhibiting platelet attachment and articles treated thereby

A method for Neutral Beam irradiation derived from gas cluster ion beams and articles produced thereby including optical elements.

Method for neutral beam processing based on gas cluster ion beam technology and articles produced thereby

A method for treating a silicon substrate, and a silicon substrate, provide a surface treated with an accelerated neutral beam.

A method of processing a trench, via, hole, recess, void, or other feature that extends a depth into a substrate to a base or bottom and has an opening with high aspect ratio (into depth from opening to base or bottom divided by minimum space of the trench therebetween) by irradiation with an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials at the base or bottom of the opening.

Enhanced high aspect ratio etch performance using accelerated neutral beams derived from gas-cluster ion beams

Apparatus and methods are disclosed for employing an accelerated neutral beam derived from an accelerated gas cluster ion beam as a physical etching beam for providing reduced material mixing at the etched surface, compared to previous techniques. This results in the ability to achieve improved depth profile resolution in measurements by analytical instruments such as SIMS and XPS (or ESCA) analytical instruments.

Methods and apparatus for employing an accelerated neutral beam for improved surface analysis

A method of modifying the surface of a medical device to release a drug in a controlled way by providing a barrier layer on the surface of one or more drug coatings. The barrier layer consists of modified drug material converted to a barrier layer by irradiation by an accelerated neutral beam derived from an accelerated gas cluster ion beam. Also medical devices formed thereby.

Drug delivery system and method of manufacturing thereof

A film and method of forming a film provides an unmodified starting layer of a starting material, the starting layer having opposed first and second surfaces and an initial thickness, T, and a modified surface layer of thickness Twhich is less than T, formed in at least a portion of the second surface, wherein a portion of the modified surface layer is not supported by unmodified starting material removed from the first surface opposite the modified surface layer.

Film and methods of forming same

A method for treating a substrate surface uses Neutral Beam irradiation derived from a gas-cluster ion-beam and articles produced thereby including lithography photomask substrates.

Growing community of inventors

Littleton, MA, United States of America

Sean R Kirkpatrick