Texas Instruments Corporation

Sean M Collins

Richard L Guldi

Kelly Jay Taylor

James David Bernstein

Jeffrey Loewecke

Jeffrey W Ritchison

Reducing chemical contaminants is increasingly important for maintaining competitive production costs during fabrication of electronic devices. There is currently no production floor capability for mapping chemical contaminants across an electronic device substrate on a routine basis. A scanning surface chemical analyzer for mapping the distributions of a variety of chemicals on substrates is disclosed. The analyzer includes an array of sensors, each of which detects a single chemical or narrow range of chemicals, a scanning mechanism to provide a mapping capability, an electrical signal analyzer to collect and analyze signals from the array of sensors and generate reports of chemical distributions, and an optical desorption mechanism to amplify detection. A preferred embodiment includes an array of miniature quadrupole mass spectrometers in the sensor array. Scanning modes include whole substrate mapping, region sampling, and spot sampling of known defect sites.

Close proximity scanning surface contamination analyzer

The present invention provides a method for placing a dopant in a substrate and a method for manufacturing an integrated circuit. The method for placing a dopant in a substrate, among other steps, includes providing a substrate () and implanting a dopant within the substrate () using an implant (), the implant () moving at varying speeds across the substrate () to provide different concentrations of the dopant within the substrate ().

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Austin, TX, United States of America

Sean M Collins