Verity Instruments, Inc.

Sean Lynes

Mark Anthony Meloni

Andrew Weeks Kueny

Mike Whelan

John D Corless

Richard J Daignault, Jr

Hong Chen

Rick Daignault

Zhiyong Gu

A method of operating a process control system and a process control system are provided by the disclosure. In one embodiment, the process control system includes: (1) an optical sensor configured to monitor a production process within a process chamber and generate optical data therefrom, (2) an operational controller configured to perform critical functions to determine processing conditions of the production process from the optical data, wherein the critical functions are directed by critical function controls, (3) an adaptable management controller configured to provide the critical function controls to the operational controller, wherein the adaptable management controller is hierarchically isolated from the operational controller during the critical functions.

Adaptable-modular optical sensor based process control system, and method of operation thereof

The disclosure provides an optical calibration device for in-chamber calibration of optical signals associated with a processing chamber, a characterization system for plasma processing chambers, methods of characterizing plasma processing chambers, and a chamber characterizer. In one example, the optical calibration device includes: (1) an enclosure, (2) an optical source located within the enclosure and configured to provide a source light having a continuous spectrum, and (3) optical shaping elements located within the enclosure and configured to form the source light into a calibrating light that approximates a plasma emission during an operation within the processing chamber.

System and method for calibration of optical signals in semiconductor process systems

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Carrollton, TX, United States of America

Sean Lynes