Hyundai Electronics Industries Co. Ltd.

Sea C Kim

Hae Sung Park

Sang I Kim

Jin Gyeong Park

Sung Kee Park

Gon Son

Kye Shin Park

Yung M Koo

Chung G Choi

Dong Duk Lee

Young I Kim

Il S Hyun

Ho G Ryoo

Jai O Koh

Heon C Lee

Soo S Yoon

A method of forming a contact region having an insulating layer which is etch protected, which includes sequentially depositing a gate oxide layer 2, a first conducting layer 3 for gate electrode, a first insulating layer 4 and a second conducting layer 5 on a silicon substrate 1. A portion of the second conducting layer 5 is etched to form an etch protective layer 5A. Portions of the etch protective layer 5A, the first insulating layer 4 and the first conducting layer 3 are sequentially etched to form separated gate electrodes 3a and 3b and separated etch protective layers 5a and 5b on the gate electrodes 3a and 3b, respectively and to expose a portion of the gate oxide layer 2 to define a source region 1A. A second insulating layer 6 is deposited on the entire surface of the resulting structure. The second insulating layer 6 is etched to form a spacer 6a on each of the side walls of the gate electrodes 3a and 3b and on the first insulating layer 4 and to expose the source region 1A. A third insulating layer 7 is deposited on the entire surface of the resulting structure. A contact region 10 is formed by selectively removing the third insulating layer 7 and the gate oxide layer 2 on the source region 1A and portions of the third insulating layer 7 on the etch protective layers 5a and 5b to form a contact region having an etch protected insulating layer.

Method of forming a self-aligned contact utilizing a polysilicon layer

A method for removing residual material which remains in a cavity after an anisotropic etching process in the manufacture of a partially completed multi-layer semiconductor device, where the cavity is in contact with at least one anisotropic etch-stop layer and is accessible by an etchable layer is disclosed. A plasma etching apparatus which includes a chamber is utilized. The etchable layer is first etched by anisotropic etching in the chamber under predetermined conditions in the plasma etching apparatus until a top of the etch-stop layer is exposed. A plasma scattering etching process is then performed to remove the residual material in the cavity by changing the predetermined conditions of the anisotropic etching process to produce plasma scattering, thereby removing the residual material from the cavity.

Method for removing residual material from a cavity during the

A method for curing spin-on-glass formed on a wafer film which insulates the metal layers and flattens any step difference in the process for manufacturing a multi-layered metal layer of a highly integrated semiconductor device which comprises establishing a predetermined initial temperature in a heating chamber with an ultraviolet light source. A wafer, on which a SOG film to be cured is formed, is then introdued into the heated chamber and the temperature gradually increased to a predetermined maximum temperature. The SOG film is irradiated with ultraviolet light at a predetermined wavelength simultaneously with the application of heat at the maximum temperature for a predetermined time. The wafer is then cooled.

Method for curing spin-on-glass film by utilizing ultraviolet irradiation

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Seoul, South Korea

Sea C Kim