Samsung Electronics Co., Ltd.

Se-Yeon Kim

Seung-Ki Chae

Jung-Dae Park

Pil-kwon Jun

Kwang-Shin Lim

Tae-Hyo Choi

Yang-Koo Lee

Myoung-Ok Han

Sunyoung Lee

Hyun-Soo Kim

Yong-Suk Tak

Sunjung Kim

Dae-hyun Sim

Chang-Seok Lee

Hyojin Yun

Teawon Kim

Young-Shik Shin

Beom-soo Cho

Minjae Kang

Hun Jung Yi

Sangpyoung Jeon

A method of forming a low-k layer includes forming a layer by providing a silicon source, a carbon source, an oxygen source, and a nitrogen source onto a substrate. The forming of the layer includes a plurality of main cycles, and each of the main cycles includes providing the silicon source, providing the carbon source, providing the oxygen source, and providing the nitrogen source, each of which is performed at least one time. Each of the main cycles includes sub-cycles in which the providing of the carbon source and the providing of the oxygen source are alternately performed.

Method of forming a low-k layer and method of forming a semiconductor device

A method and system for wireless charging using a radio wave. The method includes scanning a radio wave of an access point, determining an available charging frequency band among frequency bands, sending the access point a request for transmitting a charging radio wave at the charging frequency band, and switching power output from an antenna, to a battery circuit.

Method and system for wireless charging using radio wave

A plasma generating unit for a process monitoring device includes a hollow first electrode extending in a length direction and a second electrode extending in the length direction and positioned within and displaced from the first electrode with a distance therebetween. The first electrode has an inner diameter and the second electrode has an outer diameter selected to vary the distance between the electrodes in the length direction so that the plasma generating unit generates a plasma by ionizing a gas flowing between the electrodes at a different position in the length direction based on a pressure of the gas.

Plasma monitoring device using a cylindrical hollow electrode

A composition for removing a photoresist includes about 5 to about 20 percent by weight of an alcoholamide compound, about 15 to about 60 percent by weight of a polar aprotic solvent, about 0.1 to about 6 percent by weight of an additive, and pure water. The alcoholamide compound is chemically structured as follows: where Ris a hydroxyl group or a hydroxyalkyl group, and Ris a hydrogen atom or a hydroxyalkyl group.

Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition

Growing community of inventors

Hwaseong-si, South Korea

Se-Yeon Kim