H2optx Inc.

Scott W Tandy

Donald Arthur Ice

Rudolf J Hofmeister

Rudy Hofmeister

Optical and chemical analytical systems and methods are provided herein. In one embodiment, a method includes exposing a mixture sample to electromagnetic radiation, the mixture sample including analytes, detecting responsiveness of one or more of the analytes to the electromagnetic radiation, calculating average responsiveness of the one or more of the analytes, and calculating a concentration of the one or more of the analytes in the mixture sample using the average responsiveness.

Optical and chemical analytical systems and methods

Various systems and methods of analyzing one or more properties of a sample are provided. The system includes a self-contained purging device having a sample holder and one or more analyzers for analyzing one or more properties of the sample. The purging device is configured to remove sample contained within the sample holder when an analysis is complete. In one embodiment the purging device is configured via an air pump having a tube in fluid communication with an air inlet of the sample holder, wherein the air pump is configured to deliver pressurized air to the air inlet and thereby purge the sample. The pressurized air is localized ambient air, and substantially free of contaminants. Methods and other systems are also described and illustrated.

Analysis and purging of materials in manufacturing processes

In some aspects, a device for apportioning granular samples includes a sample feeder defining a conduit, the conduit including a first opening to receive the granular samples and a second opening. The device includes a shuttle operably coupled to the sample feeder to receive the granular samples from the conduit via the second opening. The shuttle is configured to apportion the granular samples to incrementally enter a sample chamber to be analyzed. The device includes an outlet conduit fluidly coupled to the sample chamber and configured to permit the sample chamber to be evacuated.

Devices and methods for analyzing granular samples

The present disclosure generally relates to systems, devices and methods for analyzing and processing samples or analytes. In one example configuration, a method of analyzing an analyte includes shaving a first layer of a plurality of layers of an analyte to expose a first surface of an analyte. The method includes positioning the first surface of the analyte over a window of a hyperspectral analyzation subassembly. The method further includes scanning the first surface of the analyte by the hyperspectral analyzation subassembly to obtain information regarding the analyte proximate the first surface. Other systems, devices and methods are disclosed herein.

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Los Altos Hills, CA, United States of America

Scott W Tandy