Cymer, Inc.

Science Applications International Corporation

Scott T Smith

William N Partlo

Alexander Igorevich Ershov

Igor Vladimirovich Fomenkov

Richard L Sandstrom

Richard M Ness

Richard C Ujazdowski

Daniel J W Brown

Raulf M Polichar

Victor V Verbinski

Herve A Besaucele

Eckehard D Onkels

Stuart L Anderson

David S Knowles

William G Hulburd

David Wayne Myers

Ryan Shyffer

Jeffrey M Adams

Judith Maxwell, Legal Representative

Palash P Das

John Martin Algots

Paul C Melcher

Kenneth H Valentine

Curtis L Rettig

Robert A Shannon

Ronald L Spangler

German E Rylov

Shahryar Rokni

Robert B Saethre

Jeffrey Oicles

Victor J Orphan

David M Johns

Peter Clarke Newman

Thomas Patrick Duffey

Xiaojiang Jason Pan

Jesse D Buck

Thomas D Steiger

Vladimir B Fleurov

Rajasekhar Rao

Gamaralalage G Padmabandu

Raymond F Cybulski

Alex P Ivaschenko

Paolo Zambon

Vladimir A Kulgeyko

Mark Branham

Gary Rush

Clay C Titus

Christian J Wittak

David W Meyers

Jerome A Emilo

Sunjay Phatak

Plash P Das

Aaron R Polichar

William B Thompson

David W Myers

A system for detecting and graphically displaying a contents of a fast-moving target object comprises: a radiation source, having a position such that at least a portion of radiation emitted from the radiation source passes through the fast-moving target object, the fast-moving target object having a variable velocity and acceleration while maintaining a substantially constant distance from the radiation source and being selected from the group consisting of: a vehicle, a cargo container and a railroad car; a velocity measuring device configured to measure the variable velocity of the fast-moving target object; a detector array comprising a plurality of photon detectors, having a position such that at least some of the at least a portion of the radiation passing through the target object is received thereby, the detector array having a variable count time according to the variable velocity and a grid unit size; a counter circuit coupled to the detector array for discretely counting a number of photons entering individual photon detectors, the counter circuit measuring a count rate according to a contents within the fast-moving target object; a high baud-rate interface coupled to the counter circuit for sending count information from the counter circuit at a rate fast enough to support real-time data transfer therethrough; and a processor coupled to the velocity measuring device and to the high-baud-rate interface, receiving count information from the high baud-rate interface and generating distortion-free image data in real time as a function of the count information and the variable velocity. A method for using the system is also disclosed.

Density detection using real time discrete photon counting for fast moving targets

Digital pixel data is obtained from radiographic imaging of one or more objects, and corresponds to an imaged area containing a feature to be measured. A data profile for a region around the measured feature is created from the digital pixel data. A reference profile is then created from the data profile. The reference profile represents an expected data profile for a reference condition of the objects, and accounts for the point spread function of the imager. The difference between the data profile and the reference profile is calculated. Based on that difference, the degree by which the actual condition of the objects varies from the reference condition is determined. The calculated difference can be compared to a lookup table mapping previously calculated differences to degrees of variation from the reference condition. The calculated difference can also be used as an input to an experimentally derived formula.

Measuring linear separations in digital radiographs

An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a Flaser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest Fspectral line.

Line selected F2 two chamber laser system

An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

Very narrow band, two chamber, high reprate gas discharge laser system

The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

Four KHz gas discharge laser system

An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F spectral line.

Four KHz gas discharge laser

A grating based line narrowing unit with bi-directional beam expansion for line narrowing lasers. In a preferred embodiment a beam from the chamber of the laser is expanded in the horizontal direction with a three-prism beam expander and is expanded in the vertical direction with a single prism. A narrow band of wavelengths in the expanded beam is reflected from a grating in a Littrow configuration back via the two beam expanders into the laser chamber for amplification.

Line narrowed laser with bidirection beam expansion

A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiod array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.

High resolution spectral measurement device

Very narrow band, two chamber, high rep rate gas discharge laser system

A system and method of density detection in a target object involve irradiating the target object, detecting a first and second discrete number of photons penetrating the target object through respective first and second prescribed volumes and entering respective first and second radiation detectors. First and second numbers of photons detected by the first and second radiation detectors are counted, and a display output signal is generated in response to the first and second numbers. A graphical representation of the densities within the first and second volumes of the target object is displayed.

Density detection using discrete photon counting

A gas discharge laser with a pulse multiplier. In the pulse multiplier, short pulses from the laser are divided into portions and all or all but one of these portions are delayed in delay legs by different time periods and recombined to provide a stretched output pulse having substantially reduced intensity and longer duration as compared to the pulse from the laser. Focusing optics are included in each delay leg to assure that beam size and angular spread of each portion of the combined pulse is not substantially different from other portions of the pulse.

Gas discharge laser with pulse multiplier

A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the monochromator and scanning the laser wavelength over a range which includes the monochromator slit wavelength.

High resolution etalon-grating monochromator

Growing community of inventors

San Diego, CA, United States of America

Scott T Smith