Lawrence Livermore National Security, LLC

Metal Improvement Company, LLC

University of California

The United States of America as Represented by the Department of Energy

Lawrence Livermore National Laboratory, LLC

Scott N Fochs

Lloyd A Hackel

Mark D Rotter

Thomas Frederick Soules

C Brent Dane

Stephan A Letts

Edward W H Lao

Randall L Hurd

Michael Dale Perry

Paul S Banks

Fritz B Harris, Jr

Brent C Stuart

Mark A Rhodes

Jon Rankin

Kai N LaFortune

Fritz B Harris

Jon E Rankin

Edward W Lao

Brent C Dane

A beam delivery technology for high power laser systems, like laser peening systems, for work pieces which may have compound curvatures, includes placing an optical assembly having a receiving optic, beam formatting optics and a scanner mounted thereon, in a position to receive laser pulses from a laser source and within an operating range of the process area. Polarized laser pulses are delivered to the receiving optic while the position of the optical assembly remains unchanged. The pulses proceed through the beam formatting optics to the scanner, and are direct to respective impact areas having nominal shapes and locations on the work piece. The scanning process includes for each laser pulse, setting direction, divergence, polarization, rotation and aspect ratio of the laser pulses output from the scanner, to control the polarization, shape and location on respective impact areas.

Flexible beam delivery system for high power laser systems

A beam sampling system, includes a first beam splitter adapted to split a laser beam having a primary polarization component and a secondary polarization component, into a first intermediate sample beam, and a first beam splitter output beam, the intermediate sample beam including first percentage of the primary polarization component and a second percentage of the secondary polarization component. A 90-degree polarization rotator is positioned in the intermediate sample beam line. A second beam splitter is mounted so that the intermediate sample beam is split into an output sample beam on an output sample beam line, and a second transmitted beam, the output sample beam including substantially said first percentage of the secondary polarization component and substantially said second percentage of the primary polarization component.

Polarization compensated beam splitter and diagnostic system for high power laser systems

Wavefront control techniques are provided for the alignment and performance optimization of optical devices. A Shack-Hartmann wavefront sensor can be used to measure the wavefront distortion and a control system generates feedback error signal to optics inside the device to correct the wavefront. The system can be calibrated with a low-average-power probe laser. An optical element is provided to couple the optical device to a diagnostic/control package in a way that optimizes both the output power of the optical device and the coupling of the probe light into the diagnostics.

Dichroic beamsplitter for high energy laser diagnostics

A novel method and apparatus for suppressing ASE and/or parasitic oscillation modes in a laser is introduced. By roughening one or more peripheral edges of a solid-state crystal or ceramic laser gain media and by bonding such edges to a predetermined electromagnetic absorbing material arranged adjacent to the entire outer surface of the peripheral edges of the roughened laser gain media, ASE, parasitic oscillation modes and/or residual pump energy can be effectively suppressed.

Gain media edge treatment to suppress amplified spontaneous emission in a high power laser

A novel method and apparatus for suppressing ASE and parasitic oscillation modes in a high average power laser is introduced. By roughening one or more peripheral edges of a solid-state crystal or ceramic laser gain media and by bonding such edges using a substantially high index bonding elastomer or epoxy to a predetermined electromagnetic absorbing arranged adjacent to the entire outer surface of the peripheral edges of the roughened laser gain media, ASE and parasitic oscillation modes can be effectively suppressed.

An apparatus and method to contain plasma at optimal fill capacity of a metallic container is disclosed. The invention includes the utilization of anodized layers forming the internal surfaces of the container volume. Bias resistors are calibrated to provide constant current at variable voltage conditions. By choosing the appropriate values of the bias resistors, the voltages of the metallic container relative to the voltage of an anode are adjusted to achieve optimal plasma fill while minimizing the chance of reaching the breakdown voltage of the anodized layer.

Apparatus and method for electrical insulation in plasma discharge systems

An all-reflective pulse stretcher for laser systems employing chirped-pulse amplification enables on-axis use of the focusing mirror which results in ease of use, significantly decreased sensitivity to alignment and near aberration-free performance. By using a new type of diffraction grating which contains a mirror incorporated into the grating, the stretcher contains only three elements: 1) the grating, 2) a spherical or parabolic focusing mirror, and 3) a flat mirror. Addition of a fourth component, a retro-reflector, enables multiple passes of the same stretcher resulting in stretching ratios beyond the current state of the art in a simple and compact design. The pulse stretcher has been used to stretch pulses from 20 fsec to over 600 psec (a stretching ratio in excess of 30,000).

Aberration-free, all-reflective laser pulse stretcher

Growing community of inventors

Livermore, CA, United States of America

Scott N Fochs