Optical Coating Laboratory, Inc.

Scott E Solberg

Richard Ian Seddon

Erik W Anthon

William T Beauchamp

Robert E Klinger

Richard James Ryall

Basil L Swaby

Bradley James Pond

A process suitable for forming multi-layer (up to at least several hundred layers) monotonic/linear variable/wedge filter coatings on a single substrate surface and for forming monolithic filter assemblies which incorporate such filters, is disclosed along with the designs for such filters. The monolithic process uses radially variable filter fabrication techniques in combination with ion-assisted deposition to form stress controlled, radially variable filter coatings of the desired varied optical profile, preferably using high and low index materials stich as tantala and silica. Stress is minimized by balancing the amount of ion assist and the coating rate. Slices are cut radially from the substrate to form quasi-linear variable filters. Other coatings such as, but not limited to, a wide band hot mirror can be formed on the opposite surface of the substrate from the radially variable LVF method. The method forms complex multi-layer thick filters with high yields on a single substrate surface such that the filter is free of precession or sideways leakage of light between the parallel surfaces. Also disclosed is an optical filter having stacks arranged so that the magnitude of the characteristic center wavelength of each stack increases from stack to stack along the desired direction of traversal of incident light through the filter. As a result of this sequential construction, diffuse leaks are blocked from transmission through the filter. The diffuse leak-suppressed filter can be formed by various processes, including the monolithic process.

Monolithic linear variable filter and method of manufacture

An absorbing anti-reflection coating which can be applied directly to the faceplate of a video display such as a cathode ray tube or a plasma display by physical or chemical vapor deposition comprises at least 3 materials: L, a low retractive index material such as the metal oxide SiO.sub.2 ; H, a high refractive index material such as the metal oxide Nb.sub.2 O.sub.5 ; and M, a metal or metallic alloy or metallic compound layer with a refractive index greater than 0.5 and extinction coefficient less than 5. Preferably the materials are used in the design MHLHL or HMHL. The design and materials provide broadband performance with a low layer count. The single metal layer design permits relatively low values of sheet resistance (high conductivity). Transmittance values are high, typically 70%.+-.5%. Reflectance typically is .ltoreq.0.6%.

Absorbing anti-reflection coatings for computer displays

The present invention is directed to a sputtering method for preparing optical coatings having low light scattering characteristics by controlling the angle of incidence of the material being sputtered without significantly reducing the coating efficiency of the sputtering process. The angle of incidence is controlled by reducing the collision scattering of the material being sputtered and by intercepting the sputtered material that would without interception arrive at the surface to be coated at high angles of incidence. The collision scattering is reduced by utilizing a sputtering gas that has a mass less than the mass of the material being sputtered.

Methods for preparing low scatter optical coatings

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Santa Rosa, CA, United States of America

Scott E Solberg