University of California

Other

Scott C Burkhart

Stephen P Vernon

Patrick A Kearney

The subject matter disclosed herein relates to a system for controlling strings of lights. This system can include a host controller, one or more strings of lights, and an effects modulator. Each string of light can include at least one LED light. The effects modulator can be operatively connected to the host controller and to the strings of light. The effects modulator can include a microcontroller and an inverter. The inverter can include a high side driver circuit and one or more low side driver circuits operatively connected to the high side driver circuit. Each low side driver circuit can be operatively connected to one of the strings of light. The microcontroller can be configured to receive one or more control signals from the host controller and control the strings of light via the inverter in accordance with the control signals. Related apparatus, methods, and techniques are also described.

Music synchronized light modulator

A method for producing film thickness control of ion beam sputter deposition films. Great improvements in film thickness control is accomplished by keeping the total current supplied to both the beam and suppressor grids of a radio frequency (RF) in beam source constant, rather than just the current supplied to the beam grid. By controlling both currents, using this method, deposition rates are more stable, and this allows the deposition of layers with extremely well controlled thicknesses to about 0.1%. The method is carried out by calculating deposition rates based on the total of the suppressor and beam currents and maintaining the total current constant by adjusting RF power which gives more consistent values.

Method for measuring and controlling beam current in ion beam processing

A method and apparatus for the interception and trapping of or reflection of charged particulate matter generated in ion beam sputter deposition. The apparatus involves an electrostatic particle trap which generates electrostatic fields in the vicinity of the substrate on which target material is being deposited. The electrostatic particle trap consists of an array of electrode surfaces, each maintained at an electrostatic potential, and with their surfaces parallel or perpendicular to the surface of the substrate. The method involves interception and trapping of or reflection of charged particles achieved by generating electrostatic fields in the vicinity of the substrate, and configuring the fields to force the charged particulate material away from the substrate. The electrostatic charged particle trap enables prevention of charged particles from being deposited on the substrate thereby enabling the deposition of extremely low defect density films, such as required for reflective masks of an extreme ultraviolet lithography (EUVL) system.

Electrostatic particle trap for ion beam sputter deposition

The invention combines arbitrary amplitude high-speed pulses for precision pulse shaping for the National Ignition Facility (NIF). The circuitry combines arbitrary height pulses which are generated by replicating scaled versions of a trigger pulse and summing them delayed in time on a pulse line. The combined electrical pulses are connected to an electro-optic modulator which modulates a laser beam. The circuit can also be adapted to combine multiple channels of high speed data into a single train of electrical pulses which generates the optical pulses for very high speed optical communication. The invention has application in laser pulse shaping for inertial confinement fusion, in optical data links for computers, telecommunications, and in laser pulse shaping for atomic excitation studies. The invention can be used to effect at least a 10&times; increase in all fiber communication lines. It allows a greatly increased data transfer rate between high-performance computers. The invention is inexpensive enough to bring high-speed video and data services to homes through a super modem.

High-speed pulse-shape generator, pulse multiplexer

A skimming device for removing debris from the water surface of a swimming pool is formed from a skirt member of net material. Buoyancy material is mounted on the one edge margin of the skirt member and weights are mounted on the opposite edge margin of the skirt member. Thus, the skirt member is a vertical orientation when it is in the water of a swimming pool. One or both ends of the skirt member is provided with a bar to which a handle can be releasably connected. Movement of the ends of the skirt member relative to each other along the peripheral margin of the swimming pool causes the skirt member to be moved in a manner to skim the entire water surface and eventually to form a loop which traps debris which normally floats on or near the surface of the water. Then, by pulling the skirt member while it is in the form of a loop out of the pool, the debris is removed quickly and easily from the swimming pool itself. The skirt member can then be washed with a garden hose and air dried for use at a later time.

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Livermore, CA, United States of America

Scott C Burkhart