Fujifilm Corporation

Satoshi Wakamatsu

Tadashi Omatsu

Makoto Nagao

Kenichi Kodama

Minoru Araki

Kenichiro Tamaki

Keio Okano

Kunihiko Kodama

Kazunori Komatsu

Takafumi Noguchi

Yoshinobu Katagiri

Yoshiki Sakazaki

Kenji Ichikawa

Ikuo Takano

Atsushi Morooka

Takeshi Unemura

Toshihide Ishioka

Koki Kabata

Kazuharu Nakamura

Provided is a method of manufacturing a microneedle array in which an active ingredient is concentrated at a tip while an active ingredient content is guaranteed. In order to achieve the object, a method of manufacturing a microneedle array in which needle-like recessed portions of a mold are filled with a liquid to form one dose of a patch includes determining a filling amount of the liquid from a difference in mass of the mold before and after filling of the liquid, determining a filling state of the liquid in the mold filled with the liquid, sucking the mold in which the filling amount and the filling state of the liquid are determined to be normal from a rear face, and evaporating and drying a solvent of the liquid of the sucked mold.

Method of manufacturing microneedle array

A method of producing a transdermal absorption sheet includes: filling needle-like recessed portions of a mold with a drug solution that is a polymer solution containing a drug; drying the drug solution filling the needle-like recessed portions to form a drug layer containing the drug; supplying a polymer layer forming solution to the mold, the mold provided with a step portion that has a height different from a height of a region in which the needle-like recessed portion is formed in a periphery of the region in which the needle-like recessed portion is formed in a range of equal to or greater than the step portion as seen from above, and then fixing a contact position of the polymer layer forming solution and the mold to the step portion while reducing the polymer layer forming solution; and drying the polymer layer forming solution to form a polymer layer.

Method of producing transdermal absorption sheet

Provided is a method for manufacturing a transdermal absorption sheet which suppresses the cost of manufacturing equipment and prevents deterioration of a pharmaceutical preparation or a raw material thereof, and an intermediate. A mold filled with a first polymer solution is stored in a drying container in an aseptic environment, and the first polymer solution in the mold stored in the drying container is dried outside an aseptic environment. In a case where a surface of the drying container in which the mold is stored is irradiated with an electron beam from an electron beam source, a shield that shields an electron beam is arranged at a position on a straight line connecting the electron beam source and the needle-like recessed portions.

Method for manufacturing transdermal absorption sheet

Provided is a transdermal absorption sheet capable of improving strength against impact at the time of puncture. A transdermal absorption sheet includes a sheet portion and a plurality of needle-like protruding portions arranged on a first principal surface of the sheet portion, in which the sheet portion has a center portion which is a region in which the plurality of needle-like protruding portions are formed, and an outer edge portion which is a region from the center portion to an end portion, and a maximum thickness of a thickness portion of the outer edge portion is larger than an average thickness of the center portion.

Transdermal absorption sheet

Provided are a transdermal absorption sheet capable of achieving control of the dissolution rate and suppression of diffusion of a drug, and a method of producing the same. A transdermal absorption sheet includes a sheet portion, and a plurality of needle-like protruding portions formed by a plurality of frustum portions arranged on the sheet portion and needle portions arranged on the frustum portions, in which at least one of the needle-like protruding portions has a cavity portion extending from the sheet portion to the frustum portion.

Transdermal absorption sheet and method of producing the same

The method of producing a transdermal absorption sheet includes, in this order, a filtration step of carrying out sterile filtration on a base liquid, a base liquid feeding step of feeding the base liquid to a surface of a mold having needle-like recessed portions, tip ends of which are filled with a drug solution, while leaving a space between the drug solution and the base liquid, a drying step of drying the drug solution and the base liquid, and a peeling-off step of peeling off a formed transdermal absorption sheet in which an average concentration of solid contents of the base liquid in the drying step is increased by 5% by weight or more from an average concentration in the base liquid feeding step, and then in a state in which the average concentration is 75% by weight or less, the base liquid is moved into the needle-like recessed portions.

Method of producing transdermal absorption sheet for medical use

A method of producing a transdermal absorption sheet includes: filling needle-like recessed portions on a mold having the needle-like recessed portions with a polymer solution; drying the filled polymer solution to form a polymer layer; and peeling off the polymer layer, wherein, in drying the polymer solution, low rate drying conditions are set in a concentration range in which an average solid content concentration of the polymer solution is 70 wt % to 80 wt %. When a constant drying rate of water is used as an index, in the concentration range in which the average solid content concentration of the polymer solution is 70 wt % to 80 wt %, and the constant drying rate is lower than a maximum value of a constant drying rate under a drying condition where the average solid content concentration of the polymer solution is less than 70 wt % and more than 80 wt %.

The disclosed nanoimprinting method suppresses fluctuations in thickness of residual film and defects due to residual gas in a resist film, onto which a pattern of protrusions and recesses is transferred, in a nanoimprinting method that employs the ink jet method to coat a substrate with droplets of resist material. Droplets are coated onto a substrate such that the spaces between the droplets along an A direction which is substantially parallel to the direction of the lines of a linear pattern of protrusions and recesses are longer than the spaces between the droplets in a B direction which is substantially perpendicular to the A direction, in a nanoimprinting method that coats a substrate with the droplets of a resist material using the ink jet method.

Nanoimprinting method, and method for producing a droplet arrangement pattern

To provide a transdermal absorption sheet with which control of a dissolution rate and suppression of drug diffusion can be achieved, and a method of manufacturing the transdermal absorption sheet. A transdermal absorption sheetis provided with a sheet portion, a plurality of frustum portionsthat is disposed on the sheet portion, and needle portionsthat are disposed on the frustum portions, each of the plurality of needle portionsincludes a first layercontaining a drug and a second layernot containing a drug, and at least one of the plurality of needle portionscontains an air bubble

Transdermal absorption sheet and method of manufacturing transdermal absorption sheet

A nanoimprinting mold includes: a mold main body having a fine pattern of protrusions and recesses on a surface thereof; and a mold release layer formed on the surface of the mold main body. The mold release layer is formed within a mold release layer forming region, which is a region of the mold main body that includes a patterned region where the fine pattern of protrusions and recesses is formed and has an outer edge positioned outside the outer edge of the patterned region. An outer peripheral mold release layer has a thickness distribution in which the thickness of the outer peripheral mold release layer is locally maximal at positions outside the outer edge of the patterned region, substantially continuously along the entire periphery. Thereby, it becomes possible to restrict the region in which resist flows during nanoimprinting, without employing a mesa type substrate.

Nanoimprinting mold, method for producing the nanoimprinting mold, nanoimprinting method using the nanoimprinting mold, and method for producing patterned substrates

A simulation method predicts wet spreading and unions of a plurality of droplets arranged on a patterned surface defined by a fine pattern of protrusions and recesses, the patterned surface causing anisotropy to occur in the wet spreading of the droplets. The influence imparted by the pattern of protrusions and recesses that defines the patterned surface, which is the target of analysis, on the wet spreading of the droplets is treated as wetting properties of an analysis surface, and the wet spreading and unions of the plurality of droplets on the analysis surface are analyzed by gas liquid two phase flow analysis that incorporates the wetting property parameters that represents the wetting properties.

Simulation method, simulation program, recording medium having the simulation program stored therein, method for producing droplet arrangement patterns utilizing the simulation method, nanoimprinting method, method for producing patterned substrates, and ink jet apparatus

According an aspect of the present invention, when causing the liquid ejection head to perform a feeding operation along a first direction, the substrate is retracted outside the projected feeding region of the liquid ejection head and the supporting member thereof prior to starting the feeding operation of the liquid ejection head, preventing dusts and other foreign matters, generated as a result of the feeding operation of the liquid ejection head and the supporting member, from being deposited on a surface of the substrate onto which the liquid is to be deposited.

Liquid ejection apparatus, nanoimprint system, and liquid ejection method

A resist layer constituted by a resist composition (which may include unavoidable impurities) including a polymerizable compound that includes polyfunctional monomers that become polymers having three dimensional structures by cross linking when polymerized and a polymerization initiating agent which is activated by one of light and an electron beam is formed on a substrate. A surface of a mold having a predetermined pattern of protrusions and recesses is pressed against the resist layer. Light is irradiated onto the resist layer to cure the resist layer. The mold is separated from the resist layer under conditions that the temperature of the resist layer is 40&#xb0; C. or greater.

Method for forming patterns and method for producing patterned substrates

A liquid application device includes: a liquid discharge head having a structure in which nozzles for performing droplet ejection of a functional liquid onto a substrate are aligned in a row in a predetermined direction, and including liquid chambers connected to the nozzles respectively and piezoelectric elements which are provided correspondingly to the liquid chambers and serve to pressurize the liquid in the liquid chambers; a relative movement unit for causing relative movement between the substrate and the liquid discharge head; and a droplet ejection control unit for operating the piezoelectric elements so as to cause the liquid to land discretely on the substrate, and controlling operation of the piezoelectric elements according to each of groups formed by grouping the nozzles correspondingly to the structure of the liquid discharge head.

Liquid application device, liquid application method, and nanoimprint system

Droplets of resist material are coated using the ink jet method under conditions that: the viscosity of the resist material is within a range from 8 cP to 20 cP, the surface energy of the resist material is within a range from 25 mN/m to 35 mN/m, the amount of resist material in each of the droplets is within a range from 1 pl to 10 pl, and the placement intervals among the droplets are within a range from 10 &#x3bc;m to 1000 &#x3bc;m. A mold is pressed against the surface of the substrate in a He and/or a depressurized atmosphere such that: an intersection angle formed between a main scanning direction of the ink jet method and the direction of the lines of the linear pattern of protrusions and recesses, which is an intersection angle when pressing the mold against the surface of the substrate, is within a range from 30&#xb0; to 90&#xb0;.

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Kanagawa, Japan

Satoshi Wakamatsu