Hitachi, Ltd.

Satoshi Umehara

Eiji Setoyama

Mitsuhiro Kamei

Fumihito Hirabayashi

Kazuo Sekine

A magnetic film forming apparatus includes a film forming source to emit film-forming particles, a substrate holder for holding a substrate on which a magnetic film is formed with the film-forming particles, and a magnetic field generating circuit for applying the magnetic field to the substrate. The magnetic field generating circuit includes two pairs of magnets. Each pair of magnets is composed of two bar-shaped magnets combined in a line apart from each other by a gap of distance d. The pair of magnets have respective pairs of magnetic poles, with the direction of each pair of the magnetic poles being perpendicular to the longitudinal direction of the pair of magnets and having the same orientation. The two pairs of magnets are arranged apart from each other by the distance L in the horizontal x-y plane, substantially symmetrically to the vertical central y-axis of the substrate. This way, the magnetic film forming apparatus can be decreased in size and uniform parallelism of the magnetic field can be applied to the substrate.

Magnetic film forming apparatus which applies a parallel magnetic field

A multi-chamber sputtering apparatus characterized in that a plurality of target electrodes and a substrate transfer mechanism which is able to transfer a substrate to positions facing the target electrodes and change distance between the target electrodes and the substrate.

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Hitachi, Japan

Satoshi Umehara