Sony Corporation

Fujitsu General Limited

Saturn Licensing LLC

Satoshi Tomioka

Kunihiko Nagamine

Tetsuro Kuwayama

Takahiro Matsunaga

Takashi Kobayashi

Takashi Yamaguchi

Tsuyoshi Tojo

Toshimasa Kobayashi

Satoru Kijima

Tetsuya Ito

Hideya Tamura

Shinichi Ansai

Shintaro Sanada

Takamitsu Kurokawa

Masao Ikeda

Katsunori Yanashima

Hideo Kawabe

Kazuhito Shimoda

Toshitaka Kawashima

Yoshihiro Oshima

Yutaka Imai

Naoji Nada

Yasuhiro Oka

Ryo Miyao

Ryo Koshiishi

Makoto Shimotani

Junichi Osako

When a refrigerant amount balance control is executed, in indoor units where the refrigerant supercooling degree is lower than an average refrigerant supercooling degree, the refrigerant pressure on a downstream side of indoor expansion valves decreases since the degrees of opening of the valves are decreased. On the other hand, in an indoor unit where the refrigerant supercooling degree is higher than the average refrigerant supercooling degree, although the degrees of opening of the valves are made high, the refrigerant pressure on the downstream side of the valves decreases and this decreases the refrigerant pressure on the downstream side of the indoor expansion valve, so that the difference in pressure between on the upstream side and on the downstream side of the indoor expansion valve increases and the liquid refrigerant staying at an indoor heat exchanger of the indoor unit consequently flows out into a liquid pipe.

Air conditioner

An unevenness inspection system includes an image pickup section configured to acquire a picked-up image of an inspection target, an image generation section configured to generate a color-unevenness inspection image and a luminance-unevenness inspection image, based on the picked-up image, a calculation section configured to use both of the color-unevenness inspection image and the luminance-unevenness inspection image to calculate an evaluation parameter, and an inspection section configured to use the calculated evaluation parameter to perform unevenness inspection. The image generation section generates the color-unevenness inspection image and the luminance-unevenness inspection image, based on a filter-processed color-component image and a filter-processed luminance-component image. The calculation section calculates the evaluation parameter in consideration of unevenness visibility with respect to both of color and luminance.

Unevenness inspection system, unevenness inspection method, and unevenness inspection program

An unevenness inspection apparatus includes circuitry that is configured to obtain a pickup image of a test object and modify a chroma value of a pixel in the pickup image to correct a gain of the pickup image associated with the pixel for generating a color unevenness inspection image. The circuitry is configured to generate a luminance unevenness inspection image based on the pickup image and calculate an evaluation parameter using both of the color unevenness inspection image and the luminance unevenness inspection image. The circuitry is configured to perform unevenness inspection using the calculated evaluation parameter, which is calculated based on unevenness visibility for both color and luminance.

Unevenness inspection apparatus and unevenness inspection method

An unevenness inspection apparatus including: an image pickup section obtaining a pickup image of a test object; an image generating section generating each of a color unevenness inspection image and a luminance unevenness inspection image based on the pickup image; a calculating section calculating an evaluation parameter using both of the color unevenness inspection image and the luminance unevenness inspection image; and an inspecting section performing unevenness inspection using the calculated evaluation parameter. The calculating section calculates the evaluation parameter in consideration of unevenness visibility for both color and luminance.

A display device includes: a transmission-type display member having a display area that is sequentially scanned; and an illumination member that is arranged on a rear face of the display member and includes a plurality of illumination units that are arranged so as to be aligned in a direction from one end portion side toward the other end portion side along a direction in which the display area is sequentially scanned. The illumination unit is in a light emitting state over a predetermined light emitting period after sequential scanning of display units formed from a portion of the display area, which corresponds to the illumination unit, is completed, and the illumination units are sequentially scanned from one end portion side to the other end portion side in accordance with the sequential scanning of the display area.

Display device

A transmissive-type display device having a display area which is sequentially scanned; and a lighting device arranged on a rear face of the display device, including lighting units arranged so as to be aligned in a direction from one toward the other end portion side along a direction in which the display area is sequentially scanned. The lighting units are in a light emitting state over a light emitting period after sequential scanning of display units including portions of the display area corresponding to the lighting units is completed, and the lighting units are sequentially scanned from one toward the other end portion side in accordance with the sequential scanning of the display area. A length of waiting time from the completion of sequential scanning of the display unit until the corresponding lighting unit emits light is nonlinearly decreased.

Display apparatus

A color-unevenness inspection apparatus includes: an image pickup section picking up an image of an inspection target in a color-unevenness inspection; and an image generation section generating an uneven-color image by, in the picked-up image of the inspection target obtained by the image pickup section, calculating a chroma in each unit region and identifying an uneven-color region based on a magnitude of the calculated chroma. The color-unevenness inspection apparatus further includes: a calculation section calculating, for the uneven-color region in the uneven-color image, an evaluation parameter to be used in the color-unevenness inspection; and an inspection section performing the color-unevenness inspection based on the calculated evaluation parameter. The image generation section calculates the chroma, in each unit region of the picked-up image, while performing correction processing that reflects variations in color-unevenness visibility from color to color.

Color-unevenness inspection apparatus and method

A color-unevenness inspection apparatus includes: an image pickup section picking up an image of an inspection target for a color-unevenness inspection; an image generation section generating an uneven-color image by determining one or more uneven-color regions existing in the picked-up image of the inspection target obtained by the image pickup section, and by classifying unit regions included in each of the uneven-color regions into a plurality of color groups; a calculation section calculating, on the uneven-color regions in the uneven-color image, an evaluation parameter to be used in the color-unevenness inspection; a correction section making a correction to the calculated evaluation parameter in consideration of a difference of color-unevenness visibility between the color groups; and an inspection section performing the color-unevenness inspection, based on a resultant evaluation parameter obtained by the correction.

There is provided a refrigeration apparatus in which a refrigerant accumulating in non-operating outdoor units is supplied to an outdoor unit being operated in which a shortage of refrigerant occurs without starting the compressors of the non-operating outdoor units. In the control method for the refrigeration apparatus in which to refrigerant pipinginstalled between the indoor side and the outdoor side, a plurality of outdoor unitsA,B each including a compressor, a directional control valve, an outdoor heat exchanger, an outdoor expansion valve, and an accumulatorare connected in parallel on the outdoor side, and each of the outdoor units is provided with a hot gas bypass circuitthat includes a solenoid valveand an expansion mechanismarranged in series, and is connected between high-pressure side pipingon the discharge side of the compressor and low-pressure side pipingon the accumulator side, if a shortage of refrigerant occurs when air cooling operation is performed in a state in which only the outdoor unitA is operated and other outdoor unitsB are not operated, the solenoid valvesof the non-operating outdoor unitsB are opened so that the refrigerant accumulating in the non-operating outdoor unitsB is supplied to the outdoor unitA via the hot gas bypass circuitand the low-pressure piping

Refrigeration apparatus

A refrigeration apparatus includes an outdoor unit having a first compressor and a second compressor connected in parallel with each other, a first oil separator attached to the first compressor and connected to a suction pipe of the second compressor via a first oil return piping including a pressure reducing device, and a second oil separator attached to the second compressor and connected to a suction pipe of the first compressor via a second oil return piping including a pressure reducing device. The suction pipes of the first and second compressors are connected together. The first compressor is a variable-speed compressor, and the second compressor is a constant-speed compressor. A solenoid valve selectively forming a bypass circuit with respect to the pressure reducing device, is connected in parallel with the pressure reducing device of the first oil return piping. The solenoid valve is opened when the first compressor is restarted.

Refrigeration apparatus and method for controlling the same

A laser processing apparatus includes a support table, a local exhaust device, and a laser light source unit. The support table supports a processing object. The local exhaust device directs laser light into a local exhaust unit in which pressure is locally adjusted over the support table. The laser light source unit outputs the laser light. The local exhaust device is capable of relatively being lifted from the support table by injecting a lift gas to the support table. The processing object includes a multilayer film formed of two or more layers with different materials. An input unit into which reflectance of the processing object is inputted is connected to the laser light source unit.

Laser processing apparatus, laser processing method, manufacturing method of wiring substrate, manufacturing method of display apparatus and wiring substrate

A light-emitting diode device and backlight apparatus and liquid-crystal display apparatus using light-emitting diode device are provided. A light-emitting diode device has a lens covered around a light-emitting diode chip and a processed portion for adjusting light going from the light-emitting diode chip along the central axis of the lens is provided at the light-emitting diode chip or the lens or being provided right above the lens. The light-emitting diode chip is processed near the central axis by a suitable method such as etching. Alternatively, a diffusion material containing low refractive index material portion or an angle selective film is provided on the lens. A light-emitting diode device is able to adjust a quantity of light emitted from the LED chip along the central axis of the lens so that light can be radiated with a desired angle distribution. A backlight apparatus and a liquid-crystal display apparatus are able to suppress ununiformity of brightness and ununiformity of color by using the above-mentioned light-emitting diode device.

Light-emitting diode device and backlight apparatus and liquid-crystal display apparatus using light-emitting diode device

Provided is a method of forming a substrate with which a good-quality substrate having few cracks is obtained. On a growth base made of sapphire with a thickness of smaller than or equal to 100 &#x3bc;m, a GaN substrate is grown as heating the growth base, and cooling is provided therefor. At this time, the thickness of the substrate subject to growth is made larger than or equal to 200 &#x3bc;m and the curvature thereof is made smaller than or equal to 0.03 cm, the curvature being caused by the difference in thermal expansion coefficients of the growth base and the substrate. Thus, even though the substrate is warped due to the cooling after the growth, occurrence of crack in the substrate is prevented and the good-quality substrate is obtained.

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Kanagawa, Japan

Satoshi Tomioka