Olympus Corporation

Stanley Electric Co., Ltd

Tokyo Electron Limited

Mitsubishi Denki Kabushiki Kaisha

Ricoh Company, Ltd.

Tdk Corporation

Olympus Optical Company, Ltd.

Renesas Electronics Corporation

Other

Nec Corporation

Murata Manufacturing Co., Ltd.

Oki Electric Industry Co., Ltd.

Olympus Medical Systems Corporation

Nippon Sheet Glass Company, Limited

Bridgestone Corporation

Satoshi Tanaka

Naoki Matsumoto

Chishio Koshimizu

Tomoya Takahashi

Yusuke Yabe

Yusuke Yokobayashi

Susumu Hashimoto

Takayuki Sato

Manabu Iwata

Makoto Iwasaki

Kazuhiro Takizawa

Kotaro Ogasawara

Motoo Azuma

Hisashi Nishimura

Tsuyoshi Moriya

Takeshi Ito

Masahiro Nishio

Naochika Horio

Hidetoshi Hanaoka

Yoshinobu Hayakawa

Junya Ozawa

Masahiko Tsuchiya

Shinichi Tanaka

Tomonori Tanoue

Chikara Ishizaka

Tatsuma Saito

Akihiko Mochida

Kyoichi Takahashi

Koji Omori

Shinnosuke Enomoto

Masanobu Honda

Kazuhide Hasebe

Masahiro Ito

Hideki Nakamura

Hideki Sasaki

Masaru Hori

Masatoshi Hase

Takeshi Masuda

Atsushi Endo

Yoshinori Fujikawa

Makoto Sekine

Takeshi Murata

Hiroyuki Kamee

Tatsuo Ozaki

Takaaki Sakane

Kazuishi Mitani

Hironobu Abe

Mamoru Miyachi

Toshiya Matsuda

Satomi Muto

Takeyoshi Doko

Yasuhiro Saito

Fumitaka Baba

Koji Wakimoto

Junshiro Kanda

Naruyasu Kobayashi

Toru Ito

Kaoru Kotoda

Hiroto Nagahisa

Haruhisa Watanabe

Aiko Sakai

Munehiro Kato

Takahiro Masaki

Masaaki Watanabe

Yuichi Kagami

Yasuo Komatsu

Manabu Yajima

Wataru Nakagawa

Takako Chinone

Sunao Fukuda

Noriyuki Yamada

Toshihiro Hamada

Masaki Shimizu

Masaaki Miyagawa

Masakazu Mizoguchi

Takahide Kurahashi

Takashi Suzuki

Takeshi Yabuta

Hirotaka Koyo

Yusuke Suzuki

Kenya Iwasaki

Kenichi Kanemasa

Koichiro Ito

Kenji Negura

Masayoshi Kawada

Seiichi Endo

Hideaki Maehara

Makoto Nakane

Yutaka Matsui

Toru Ochiai

Yoshihiko Minagawa

Tadashi Mitsunari

Yoshiaki Ogiwara

Sho Iwayama

Masayoshi Kondo

Takashi Asakawa

Yoshihiko Kamiya

Kentaro Hase

Hiroyuki Hirokawa

A processing system distributes registration data that a registrar device has to a plurality of servers in a state of being segmented shares, and stores the registration data in the servers. Each of the servers includes first processing circuitry configured to perform anonymization on the shares, and provide anonymization-processed information on which anonymization is performed in the state of being shares.

Processing system, processing method, and processing program

A film forming method is provided. In the film forming method, a mask is prepared based on a measurement result of a surface state of a substrate. The mask is transferred into a process chamber and the substrate is transferred into the process chamber. Then, a film is formed on a back surface of the substrate while the mask is disposed onto the back surface of the substrate.

Film forming method and semiconductor production apparatus

An aggregation method includes: acquiring log information including a measurement value of a force used by a processing apparatus and a measurement date and time, the measurement value being measured by a sensor of the processing apparatus that processes a substrate; storing the measurement value of the force and the measurement date and time included in the acquired log information in a storage unit; and integrating the measurement value of the force associated with the measurement date and time in a specified aggregation period with reference to the storage unit to calculate an integrated value of the force for each processing apparatus.

Aggregation method and processing apparatus

The present invention provides a cover glass that can be installed in an automobile so as to cover a display unit including a plurality of information areas, including a glass body that has a first surface facing the display unit side, and a second surface opposite to the first surface, and that includes a plurality of transmission areas respectively corresponding to the information areas.

Cover glass

A light source device includes a semiconductor light source that radiates light at a light quantity according to an applied current, a circuit that determines a current instruction value based on control information, first and second drive units, each of the units that is connected to the semiconductor light source and the circuit, and is capable of outputting, to the semiconductor light source, a current having magnitude corresponding to the current instruction value. The control information is set based on brightness of an image captured by an imaging element. When one of the first and second drive units is switched to the other, the circuit causes the other to start the current output after an elapse of a predetermined stop time period having a length at a predetermined ratio or less to a frame rate on the imaging element since a stop of the current output from the one.

Light source device, endoscope system, and control method for light source device

An endoscope light source device includes a light source device and a light source controller. A first light and a second light are narrow band light in a blue region. A third light is in a green region. A fourth light is in a red region. A first light amount ratio is a ratio of a sum of the light amounts of the first light and the second light, the light amount of the third light, and the light amount of the fourth light. A second light amount ratio is a light amount ratio of the first light and the second light. The light source controller adjusts the light amount ratio of the first light and the second light to achieve the second light amount ratio so as to adjust the color representation from a yellow region to a red region in an image of an object.

Endoscope light source device, endoscope apparatus, operating method of endoscope light source device, and light amount adjusting method

An imaging system includes a lighting controller for independently controlling emission of illumination light to be emitted by a light source in: (i) a non-all-line exposure period, which contains a reading period in which electrical signals are sequentially read out on a horizontal-line basis from an image sensor for one frame or one field period, and in which at least one horizontal line of the horizontal lines for the one frame or the one field period is not exposed to light, and (ii) in an all-line exposure period, in which all of the horizontal lines for the one frame or the one field period are exposed to light.

Image system, endoscope system, light source device, and control method for light source device

An endoscope system includes: a light source including one or more semiconductor light sources; an image pickup apparatus configured to pick up an image of the object irradiated with the illumination light to obtain the image; and a processor. The processor is configured to detect brightness of the image, to change one of a current value and an application period of a current applied to the semiconductor light source when the brightness of the image belongs to a first brightness range, to change the brightness of the image by predetermined processing, to which the image is subjected, when the brightness of the image belongs to a second brightness range, and to change the other of the current value and the application period of the current applied to the semiconductor light source when the brightness of the image belongs to a third brightness range.

Endoscope system, processor for endoscope, method of controlling endoscope system, and recording medium

According to one embodiment, there is provided a carbon hard mask laminated on an etching target film, in which the concentration ratio of a methylene group CHand a methyl group CHcontained in the carbon hard mask satisfies the expression CH/(CH+CH)≥0.5.

Carbon hard mask, film forming apparatus, and film forming method

A light source device includes a plurality of light emitters, an optical system configured to combine light from the light emitters, a wavelength selective filter located on an optical path of the optical system, and an optical sensor configured to receive light from one light emitter among the light emitters through an optical filter. The optical filter has a wavelength selection characteristic corresponding to a wavelength selection characteristic of the wavelength selective filter.

Light source device and endoscope system including the same

An endoscope apparatus includes a light emitting element, an image pickup device of a rolling shutter scheme, and a control section. The control section performs control for switching between a first illumination mode for irradiating light on a subject in a readout period in which readout of an electric signal is performed in order for each of lines in the image pickup device and a second illumination mode for not irradiating light on the subject in the readout period. The control section controls the image pickup device to perform electronic shutter processing in all-line exposure period in which exposure of a plurality of lines is simultaneously performed in a frame corresponding to timing when one of the first illumination mode and the second illumination mode is switched to the other illumination mode.

Endoscope apparatus and video processor

A temperature measurement substrate according to an embodiment of the present disclosure includes: a substrate which is any one of a semiconductor wafer and a substrate for a flat panel display; and at least one optical fiber laid on a surface of the substrate and having a first pattern portion and a second pattern portion formed more densely than the first pattern portion.

Temperature measurement substrate and temperature measurement system

A light source device for endoscope includes a rotational body configured to rotate with a rotational axis as a center; a fluorescent body arranged in a predetermined area of the rotational body and configured to generate fluorescence by excitation light being radiated; an illuminating portion capable of selectively radiating excitation light of a first quantity and excitation light of a second quantity which is larger than the first quantity to a fluorescent body; and a control portion configured to switch between a first state of radiating the excitation light of the first quantity to the fluorescent body arranged in a first area and a second state of radiating the excitation light of the second quantity to the fluorescent body arranged in a second area.

Light source device for endoscope and endoscope system

A light source device for endoscope includes: an irradiation portion capable of radiating excitation light; a rotating body provided on an optical axis of the excitation light and configured to rotate with a rotating shaft as a center; a phosphor arranged in an irradiation area of the excitation light, and configured to generate fluorescence by being irradiated with the excitation light; a light quantity control portion configured to control irradiation intensity or irradiation time of the excitation light; and a rotation control portion configured to rotate the rotating body at a predetermined speed when the excitation light is radiated with a first irradiation intensity or time and rotate the rotating body faster than the predetermined speed when reducing the irradiation intensity or the irradiation time of the excitation light is reduced in the irradiation intensity or time vis-a-vis the first ones.

A plasma processing apparatus includes a processing chamber, a first electrode and a second electrode disposed to face each other, a high frequency power supply unit for applying a high frequency power to either the first electrode or the second electrode, a processing gas supply unit for supplying a processing gas to a processing space, and a main dielectric member provided at a substrate mounting portion on a main surface of the first electrode. A focus ring is attached to the first electrode to cover a peripheral portion of the main surface of the first electrode and a peripheral dielectric member is provided in a peripheral portion on the main surface of the first electrode so that an electrostatic capacitance per unit area applied between the first electrode and the focus ring is smaller than that applied between the first electrode and the substrate by the main dielectric member.

Plasma processing apparatus

Growing community of inventors

Tokyo, Japan

Satoshi Tanaka