M - Fsi Ltd.

M&bull;fsi Ltd.

M&middot;fsi Ltd.

Satoshi Shikami

Takeji Ueda

Kousaku Matsuno

Masao Iga

Jun Kanayasu

Masato Kawasaki

A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.

Substrate cleaning apparatus

A mixing feeder is disclosed for a slurry that contains liquids at a desired mixing ratio. The liquids include at least a dispersion of fine abrasive particles and a solution of an additive. The slurry mixing feeder has suction ports for sucking the liquids from a reservoir; a discharge port for feeding the slurry to the chemical mechanical polishing machine; feed pumps arranged in feed lines for the respective liquids, the feed lines extending from the individual suction ports to the discharge port, for sucking the individual liquids in specific amounts to give the mixing ratio and delivering the thus-sucked liquids toward the discharge port; and dampers and pressure-regulated restrictors arranged in combination in the feed lines on delivery sides of the feed pumps, respectively.

Slurry mixing feeder and slurry mixing and feeding method

A supporting apparatus for supporting a substrate in drying a substrate surface of the substrate including a supporting rod having a hollow interior portion and a groove configured to support a substrate on the supporting rod, the groove communicating to the hollow interior portion, a porous material disposed in the hollow interior portion of the supporting rod such that the porous material contacts with the substrate being supported in the groove, and a vacuum device configured to provide suction in the hollow interior portion of the supporting rod.

Supporting fixture of substrate and drying method of substrate surface using the same

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Okayama, Japan

Satoshi Shikami