Nissin Electric Co., Ltd.

Panasonic Intellectual Property Management Co., Ltd.

Satoshi Otani

Hiroshi Murakami

Takahiro Nakahigashi

Hajime Kuwahara

Hiroya Kirimura

Takao Tabata

Shinsuke Takeguchi

Yasushi Sugawara

Tomohiro Kuroha

Mitsuo Yoshimura

Hiroshi Maeda

A polymer electrolyte fuel cell according to the present invention includes: a unit cell including a membrane-electrode assembly and a pair of separators; a manifold; a gas introducing member; and a first member. A recess is formed at a gas lead-out port side of the gas introducing member so as to be connected to the gas lead-out port. The first member is provided such that a communication portion thereof communicates with the manifold. The gas introducing member is provided such that: the recess communicates with the communication portion; and when viewed from a thickness direction of the polymer electrolyte membrane, the gas lead-out port and a main surface of the first member overlap each other.

Polymer electrolyte fuel cell with a recess is formed downstream of a gas lead-out port

In a plasma-CVD method and apparatus, plasma is formed from a film material gas in a process chamber and, in the plasma, a film is deposited on a substrate disposed in the process chamber. Formation of the plasma from the material gas is performed by application of an rf-power prepared by effecting an amplitude modulation on a basic rf-power having a frequency in a range from 10 MHz to 200 MHz. A modulation frequency of the amplitude modulation is in a range from 1/1000 to 1/10 of the frequency of the basic rf-power. Alternatively, the rf-power is prepared by effecting on the basic rf-power a first amplitude modulation at a frequency in a range from 1/1000 to 1/10 of the frequency of the basic rf-power, and additionally effecting a second amplitude modulation on the modulated rf-power. A modulation frequency of the second amplitude modulation is in a range from 1/100 to 100 times the modulation frequency of the first amplitude modulation.

Plasma-CVD method and apparatus

In a plasma processing apparatus, wherein a power application electrode for generating plasma and an electrode opposed thereto are disposed in a process chamber which can be exhausted to attain a predetermined vacuum pressure, an electric power is applied to the power application electrode to generate the plasma from a process gas introduced between the electrodes, and intended plasma processing is effected on a substrate mounted on one of the electrodes in the plasma, the apparatus includes a particle discharge duct which surrounds a periphery and a rear side of the power application electrode and has an opening at a position neighboring to the periphery of the power application electrode, and an exhaust device connected to the duct at a position corresponding to a central portion of the rear side of the power application electrode.

Plasma processing apparatus

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Osaka, Japan

Satoshi Otani