Other

Olympus Optical Company, Ltd.

Satoshi Mizukawa

Toru Nagase

Shigeki Ariura

Shin Maki

Takefumi Uesugi

Norihiko Hareyama

Makoto Inaba

Shinji Hatta

Akira Sakaguchi

Nobuyuki Furukawa

Wataru Karino

Shigenobu Iwahashi

Thermal treatment apparatus

A thermal treatment apparatus comprises a control unit that stops issuing a signal for laser beam activation transmitted over the foot switch signal cable when the temperature obtained by the mirror temperature sensor that detects the temperature of the laser emission part provided at the laser irradiation unit exceeds a predetermined value. This stops the output of the laser beam from the laser generator Alternatively, the control unit can adjust the output value of the laser beam generated by the laser beam generator by transmitting a signal via the communication cable to change it in accordance with the detection signal of the mirror temperature sensor

A thermatological device comprising an applicator and a main body. The applicator has a microwave-applying section, a first temperature sensor and a second temperature sensor. The main body contains a control unit. The microwave-applying section applies microwaves to an affected part, thereby treating the part. The first temperature sensor detects the temperature of the affected part being treated. The, the second temperature sensor detects a part located adjacent to the affected part. The control unit controls the microwave-applying section to render the temperature detected by the first temperature sensor equal to a preset target temperature. The control unit causes the microwave-applying section to stop or reduce the emission of microwaves when the temperature detected by the second temperature sensor reaches a preset burn temperature.

Electromagnetic-wave thermatological device

Growing community of inventors

Tokyo, Japan

Satoshi Mizukawa