Kabushiki Kaisha Toshiba

Senju Metal Industry Co., Ltd.

Hitachi-kokusai Electric Inc.

Hino Jidosha Kogyo Kabushiki Kaisha

Canon Kabushiki Kaisha

Konica Minolta, Inc.

Adeka Corporation

Satoshi Masuda

Katsuya Okumura

Osamu Iwasaki

Hitoshi Nishikori

Norihiro Kawatoko

Atsuhiko Masuyama

Takashi Akagawa

Munehiro Ogasawara

Masayuki Iijima

Tetsuya Ito

Yoshikazu Watanabe

Tomoki Yamamuro

Naoki Sato

Hiroko Nakamura

Fumiko Suzuki

Ryoichi Kurata

Tetsuo Koike

Haruki Komano

Kinya Usuda

Fumiaki Shigemitsu

Yoji Ogawa

Hironori Naoi

A train monitoring system in the present embodiment is provided with a compartment camerathat takes an image of the inside of a compartment of the train, a processing serverthat calculates a vacancy probability for each reserved seat on the basis of the image taken by the compartment camerawhile the train is running and detects a resale candidate seat by comparing the vacancy probability with a threshold value, and a touch panel monitorthat displays resale candidate seat information indicating the resale candidate seat that has been detected by the processing server

Train monitoring system and train monitoring method

A sliding member having a supporting layer composed of an iron-based metallic material and a sliding layer formed on a surface of the supporting layer and composed of a copper-based metallic material. The surface of the supporting layer and the sliding layer have non-flat surfaces. A sliding surface having a non-flat surface is formed on the surface of the sliding layer. The sliding layer is formed on the roughened surface of the supporting layer by thermal spraying. The surface of the sliding layer is then subjected to a shot blasting treatment to form the sliding surface which has an uneven surface having an arithmetic average roughness (Ra) of more than 0 &#x3bc;m and 2.0 &#x3bc;m or less, a ten-point average roughness (Rz) of more than 0 &#x3bc;m and 7.5 &#x3bc;m or less and a surface hardness (Hv) of 150-250, and which slidably supports an object to be slid.

Sliding member and method for manufacturing sliding member

A sliding member which has joined strength that is suitable for the circumstance, to which heavy load is applied, and which is excellent in abrasion resistance property. The sliding member contains a supporting layer composed of ferrous metallic material, and a sliding layer composed of copper metallic material, which is formed on a surface of the supporting layer. The surface of the supporting layer and the sliding layer are configured not to be a plane and a sliding surface formed on a surface of the sliding layer is configured not to be a plane. The sliding layer is formed on the roughened surface of the supporting layer by thermal spraying.

Sliding member and method of manufacturing the sliding member

A sliding member having a hardness proper for an environment where a high-pressure is applied and having a good abrasion resistance. A sliding membercomprises a first sintered compact layerformed by solidifying an iron-based metallic powder with a sinter; and a second sintered compact layerformed by solidifying a copper-based metallic powder on a surface of the first sintered compact layerto improve a sliding characteristic. The second sintered compact layeris densified by a blast process where the powder is collided against a surface of the second sintered compact layer

Sliding member and production method for same

The state of charging and discharging of a secondary cell circuit varies with battery deterioration and with the margin for charging and discharging. The state of charging and discharging is detected accurately without coming into contact with any unit cells, and maintenance and inspection can be performed efficiently. Charging and discharging characteristics of the battery are held in a memory, and charging current and discharging current are controlled by comparing measured voltage and current values with the charging and discharging characteristics held in the memory. Furthermore, battery information relating to each unit cell is transmitted by radio signals and the substance of this information is displayed at the driver's seat.

Control system for a vehicle-mounted battery

A method of repairing a defect existing on a photo mask comprising a transparent substrate and a mask pattern formed on the substrate, comprises steps of irradiating a focused ion beam toward the defect and supplying XeF.sub.2 gas to the defect, when an etching rate of the defect by the focused ion beam and XeF.sub.2 is 1.7 times greater than an etching rate by a sole irradiation of the focused ion beam.

Photo mask and apparatus for repairing photo mask

Graphic data for forming a light-shielding pattern and graphic data for forming a semitransparent pattern are stored in first and second memories, respectively. A synthesis circuit converts the graphic data stored in the first and second memories into bit patterns and writes them in a third memory. A line width determination circuit determines, as a halftone region, a region having the number of continuous bits at the same level, which number is a predetermined number or less, in the bit patterns stored in the third memory. A pattern data generation circuit generates pattern data constituted by the signal levels of a light-transmitting region and a light-shielding region on the basis of an output signal from the synthesis circuit. A pattern data correction circuit corrects the signal level of the pattern data corresponding to the halftone region designated by the line width determination circuit to a signal level corresponding to a semitransparent film in accordance with the transmittance of the semitransparent film. A comparator compares the corrected pattern data output from the pattern data correction circuit with a signal output from a line sensor and corresponding to a halftone type phase shift mask to be inspected, thereby inspecting the patterns.

Apparatus for inspecting pattern of photomask and method therefor

According to a method of repairing a pattern using a photomask pattern repair device of the present invention, a reference point is set within a reference point confirmation scanning area on a pattern member and near a pattern repair range on the pattern member, and a protection film is formed by a material other than that of an underlying member, so as to cover the reference point confirmation scanning area. A through hole is then formed so as to penetrate only the protection film. The scanning area is scanned with a charged particle beam to cause a secondary ion to be emitted from the underlying member only through the through hole. The secondary ion is detected to confirm a reference position corresponding to the through hole. When a variation in the orbit of the charged particle beam is detected from the confirmed reference position, the position of the charged particle beam is corrected in accordance with an amount of drift of the variation.

Method of repairing a pattern using a photomask pattern repair device

Prior to etching by an etchant, a low concentration solution of cerium ammonium nitrate [(NH.sub.4).sub.2 Ce(NO.sub.5).sub.6 ] is caused to adhere onto an electron-beam resist pattern, thus to improve hydrophilic property of the resist pattern. As a result, a metal thin film is etched in conformity with the resist pattern. Thus, a fine pattern of the metal thin film is provided.

Method of forming pattern and apparatus for implementing the same

Growing community of inventors

Tokyo, Japan

Satoshi Masuda