Mitsubishi Heavy Industries Limited

Satoshi Kokaji

Hideo Yamakoshi

Yoshiaki Takeuchi

Masayoshi Murata

Hiroshi Mashima

Tatsuji Horioka

Koji Satake

Shoji Morita

Yoshikazu Nawata

Masatoshi Hisatome

Kengou Yamaguchi

A plurality of electrode bars are arranged in parallel with each other, and side electrode bars are connected to the corresponding opposite ends of the electrode bars, thereby forming a ladder-like RF discharge electrode. Power supply points are arranged axisymmetrically with respect to a reference line, which is a bisector which bisects one side of the RF discharge electrode, while being spaced a predetermined distance from the reference line, thereby suppressing voltage distribution on the ladder electrode, which has an effect on uniformity of discharge distribution, to a sufficiently low level of nonuniformity. Thus, uniform distribution of film deposition rate can be obtained, thereby enabling uniform deposition even in large-area applications.

Discharge electrode, RF plasma generation apparatus using the same, and power supply method

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Tokyo, Japan

Satoshi Kokaji