Tokyo Ohka Kogyo Co., Ltd.

Sony Corporation

Mitsubishi Electric Corporation

Tokyo Institute of Technology

Tokyo Ohka Kogyo., Ltd.

Satoshi Fujimura

Hideo Hada

Takeshi Iwai

Yasuhiko Kato

Naotaka Kubota

Miwa Miyairi

Kiyonobu Kojima

Jun Iwashita

Takashi Sasai

Toshikazu Tachikawa

Naoki Fujisawa

Junji Ooi

Mitsuru Sato

Masaaki Yoshida

Taku Hirayama

Keita Ishiduka

Tomotaka Yamada

Toshikazu Takayama

Ryoichi Takasu

Utaha Shizuka

Syuji Yonekura

Masachika Sasaki

Tatsuo Kuroiwa

Hisashi Hosaka

Kazuhito Sasaki

Junichi Rekimoto

Kazuo Ishii

Toshimasa Nakayama

Hiroaki Ogawa

Hiroaki Kitano

Mitsuo Okumura

Satoshi Akagawa

Yasuharu Asano

Naoki Miyamoto

Keiichi Yamada

Hiroshi Komano

Masaru Takeshita

Hiroshi Kakuda

Masahiro Suzuki

Fumitake Kaneko

Makoto Akabane

Yoshiyasu Kubota

Ryotaro Hayashi

Masanori Nomura

Shigeya Yasui

Masato Shimakawa

Atsuo Hiroe

Hiroshi Nagatani

Masahiro Hara

Kenta Hatano

Kimihisa Yamamoto

Hitoshi Honda

Isao Hirano

Satoshi Hiroi

Yuki Murata

Syogo Matsumaru

Naohiro Yokoo

Toshiyuki Umemoto

Toshiaki Kusakabe

Takane Imaoka

Yukiko Sakata

Shuji Yonekura

Masahide Sumiyoshi

Bin Lin

Bao Hongchang

Kazunori Sasano

A method for preparing carbon nanotubes including attaching a catalyst consisting of a compound in which a transition metal element of Group 8, 9 or 10 is coordinated to a nitrogen-containing dendrimer compound having at least one nitrogen atom, to which a metal element may be coordinated, on a surface of a substrate, and thermally decomposing a carbon compound in the vicinity of the substrate while supplying the carbon compound on the surface of the substrate to which the catalyst is attached. The catalyst for producing the carbon nanotubes is a compound in which a transition metal element of Group 8, 9 or 10 is coordinated to a nitrogen-containing dendrimer compound having at least one nitrogen atom to which a metal element may be coordinated.

Method of preparing carbon nanotubes and catalyst for producing carbon nanotubes

A brushless motor position detection device has a set of first Hall elements (main Hall ICsfor detecting magnetic pole positions) and a set of second Hall elements (sub-Hall ICsfor detecting magnetic pole positions) mounted on a plane facing a magnetic pole position detecting magnetfor detecting the position of a rotor. They are subjected to offset adjustment and are mounted in such a manner that the difference between the maximum value of the magnetic flux density at the mounting positions of the first Hall elements and the maximum value of the magnetic flux density at the mounting positions of the second Hall elements is held within a prescribed limit (mounted in such a manner as to have the offset of a prescribed machine angle in the circumferential direction) to bring the detection accuracy of the plurality of sets of the Hall elements into agreement.

Brushless motor position detection device

An information processing apparatus includes a content metadata obtaining unit configured to obtain content metadata; a determination unit configured to determine the category of the content metadata; an editing unit configured to edit the content metadata so that, when text data of the content metadata is to be reproduced on the basis of the category of the content metadata determined by the determination unit, information on a predetermined link destination is displayed in response to a predetermined operation being performed on the reproduced text data; a reproduction unit configured to reproduce the text data of the content metadata in synchronization with the reproduction of the content; and a display unit configured to display the information on the link destination on the basis of the content metadata edited by the editing unit when the predetermined operation is performed on the text data of the content metadata reproduced by the reproduction unit.

Information processing apparatus and method, and program

There is provided a positive type resist composition comprising (A) a resin component with only units derived from an acrylate ester in the principal chain, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent component, wherein the resin component (A) is a copolymer comprising (a1) a structural unit derived from an acrylate ester comprising, as an acid dissociable dissolution inhibiting group on a side chain, a polycyclic dissolution inhibiting group which is eliminated more easily than a 2-methyl-2-adamantyl group, (a2) a structural unit derived from an acrylate ester comprising a lactone containing polycyclic group on a side chain, and (a3) a structural unit derived from an acrylate ester comprising a hydroxyl group containing polycyclic group on a side chain; as well as a resist pattern formation method using such a composition.

Positive resist composition and method of forming resist pattern

An information processing apparatus includes area image extracting means for extracting, as a telop image, an area displaying a telop in contents, detecting means for detecting a scene change in images of the contents, recording means for converting an image at the time when a scene change is detected by the detecting means to a thumbnail image and recording the thumbnail image, display control means for controlling to arrange and display a plurality of the thumbnail images and a plurality of the telop images chronologically, and playing means for playing the contents from the position corresponding to the selected thumbnail image or telop image.

Information processing apparatus, method and program

A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a positive resist composition comprising a resin component (A) which contains an acid dissociable, dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B), and an organic solvent (C), wherein the component (A) contains a structural unit (a1) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group, but contains no structural units (a0), including structural units (a0-1) containing an anhydride of a dicarboxylic acid and structural units (a0-2) containing a phenolic hydroxyl group.

Resist composition

A polymer, a positive resist composition, and a method for forming a resist pattern that are able to form a resist pattern with a high level of resolution and excellent etching resistance. The present invention uses a polymer that contains a structural unit (a1) represented by a general formula (a-1) shown below and a structural unit (a2) represented by a general formula (a-2) shown below, another polymer that contains the structural unit (a1) and a structural unit (a3) represented by a general formula (a-3) shown below, and another polymer that contains the structural unit (a1), the structural unit (a2), and the structural unit (a3). 

Polymer, positive resist composition and method for forming resist pattern

The present invention is intended to perform text-to-speech conversion by replacing URLs and electronic mail addresses included in the text data of electronic mail by registered predetermined words. A mail watcher application control section executes the processing for converting electronic mail received by a MAPI mailer into speech data. The mail watcher application control section outputs URLs and electronic mail addresses included in the text data of electronic mail supplied from the MAPI mailer to a URL and mail address filter to replace them by registered predetermined names. Of the entered texts, the URL and mail address filter compares the URL or mail address included in the entered text with those registered in the URL and mail address table. If a the URL or mail address of the entered text is found matching, the URL and mail address filter replace it by the registered name and outputs it to the mail watcher application control section.

Information processing apparatus and method, recording medium, and program for converting text data to audio data

A resist composition is disclosed that enables formation of a favorable resist pattern using a shrink process in which, following formation of the resist pattern, a treatment such as heating is used to narrow the resist pattern, and also disclosed are a laminate and a method for forming a resist pattern that use such a resist composition. This resist composition includes a resin component (A) that displays changed alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure. The component (A) contains structural units derived from a (meth)acrylate ester, and exhibits a glass transition temperature that falls within a range from 120 to 170&#xb0; C.

Resist composition, multilayer body, and method for forming resist pattern

A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a positive resist composition comprising a resin component (A) which contains an acid dissociable, dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B), and an organic solvent (C), wherein the component (A) contains a structural unit (a) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group, but contains no structural units (a), including structural units (a-) containing an anhydride of a dicarboxylic acid and structural units (a-) containing a phenolic hydroxyl group.

There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

Positive type resist composition and resist pattern formation method using same

A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein

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Kawasaki, Japan

Satoshi Fujimura