Hitachi-Kokusai Electric Inc.

Kokusai Electric Corporation

Techno Quartz Inc.

Satoshi Aizawa

Shinya Morita

Masakazu Shimada

Yukinori Aburatani

Masayoshi Minami

Takashi Nogami

Shinobu Sugiura

Seiyo Nakashima

Tomoyuki Yamada

Hiromi Okada

Masayuki Yamada

Mitsuhiro Nagata

Kazuyuki Okuda

Tetsuya Marubayashi

Kiyoaki Yamada

Hiroto Iwaki

Kazuhisa Osaka

End effector for handling wafers

A technique is capable of preventing particles from adhering onto a wafer when a lid is attached or detached from a pod. A substrate processing apparatus includes: a placement part whereon a substrate container is placed; a guide part constituting a lid opening/closing space; a gate part separating the lid opening/closing space from a transfer chamber; a lid opening/closing mechanism provided in the lid opening/closing space and configured to attach or detach a lid of the substrate container; a gas introduction mechanism configured to supply a gas into the substrate container; a monitor part configured to monitor and adjust an inner pressure of the substrate container; and a controller configured to: (i) control the lid opening/closing mechanism; and (ii) control the monitor part to maintain the inner pressure of the substrate container higher than an inner pressure of the lid opening/closing space while the lid opening/closing mechanism detaches the lid.

Substrate processing apparatus

Pattern wafer

Semiconductor manufacturing equipment

Growing community of inventors

Toyama, Japan

Satoshi Aizawa