Canon Kabushiki Kaisha

Satoru Mizouchi

Masayuki A Suzuki

Hideki Ogawa

Tsunefumi Tanaka

Masatake Kato

Masaharu Eguchi

An illumination apparatus includes an inner-surface reflecting type integrator, an optical system for directing a beam from a light source to a portion of incidence of the inner-surface reflecting type integrator, an wave-front splitting type integrator, an image-forming optical system for arranging the portion of incidence of the inner-surface reflecting type integrator approximately conjugate with a portion of incidence of the wave-front splitting type integrator, and for directing a beam from the beam mixer to the wave-front splitting type integrator, and an irradiating optical system for superimposing multiple beams from the wave-front splitting type integrator on a plane to be irradiated, wherein a stop is provided at or near the portion of exit of the inner-surface reflecting type integrator.

Illumination apparatus with light shielding near an exit plane of an optical pipe and projection exposure apparatus using same

An illumination apparatus includes an optical integrator for illuminating a target plane by using light emitted from a light source, the illumination apparatus forming an approximately rectangular illuminated area by using light emitted from the optical integrator that includes a first optical system for enlarging the beam in a longitudinal direction of the illuminated area, and a second optical system for enlarging the beam in a lateral direction of the illuminated area, wherein a light exit plane of the first optical system is provided closer to the target plane than that of the second optical system.

Illumination apparatus, exposure apparatus, and device fabricating method using the same

An illumination apparatus that can adjust telecentricity of beams on a wafer without reducing the use efficiency of light is provided. The illumination apparatus moves an inner surface reflection type optical integrator in a direction orthogonal to an optical axis, and thus shifts light intensity distribution on a light emission surface thereof, thereby shifting the baricenter of the light intensity distribution on a light incident surface of multi-beam generation means. Therefore, the telecentricity of image-forming beams on the axis may be adjusted.

Illumination apparatus and projection exposure apparatus

An illumination system includes a light mixing system for mixing light from a light source and emitting the mixed light, a multi-beam producing system for wavefront dividing the light from the light mixing system and for producing plural light beams, an imaging system for forming an image of a light exit surface of the light mixing system on a light entrance surface of the multi-beam producing system, an illuminating system for illuminating a surface to be illuminated, with plural light beams from the multi-beam producing system in a state in which the light beams are superposed one upon another, and an adjusting system for adjusting a light quantity distribution upon the light entrance surface of the multi-beam producing system.

Illumination system and exposure apparatus having the same

An illumination system includes a light source and an optical system for projecting light from the light source to a surface to be illuminated, wherein the optical system includes an optical element having a paraxial power of substantially zero and having an aspherical surface, and the optical element is movable along an optical axis when an illuminance distribution on the surface to be illuminated is to be changed.

Illumination system and exposure apparatus

An illumination system includes an optical integrator having an element lenses arrayed in a direction perpendicular to an optical axis, and an optical system for directing lights from the element lenses of the integrator t a surface to be illuminated, wherein the element lenses include particular element lenses having different optical characteristics which are determined so that upon the surface to be illuminated those lights from the particular element lenses are partly superposed one upon another to provide a non-uniform illuminance ditribution on the surface with respect to a predetermined direction.

An illumination optical system includes a light source which produces a light beam, the light beam having an anisotropic coherence, with a high coherence direction and a low coherence direction, and an optical integrator, which includes a plurality of lens elements upon which the light beam is incident. The plurality of lens elements each include an opening having a long direction and a short direction. The long direction of each of the plurality of lens elements is aligned with the high coherence direction of the light beam, and the short direction of each of the plurality of lens elements is aligned with the low coherence direction of the light beam.

Illumination optical system, exposure device and device manufacturing

An optical arrangement including a stop, and an optical element with a diffractive optical surface, wherein the diffractive optical surface is defined on a spherical surface of a curvature radius r, and wherein, where the distance from a point on the diffractive optical surface, which is on an optical axis, to a center of the stop as viewed from the diffractive optical surface is t, a relation 0.8.ltoreq.r/t.ltoreq.1.2 is satisfied.

Optical arrangement with diffractive optical element

An illumination optical system includes a first diffraction optical element, a second diffraction optical element and a condenser lens. The first diffraction optical element has a plurality of micro diffraction optical elements, which have a first optical power in a first direction and an optical power different from the first optical power in a second direction, perpendicular to the first direction. The second diffraction optical element has a plurality of micro diffraction optical elements, which have a second optical power in the second direction and an optical power different from the second optical power in the first direction. The first optical power is different from the second optical power. Light supplied from a light source forms a plurality of secondary light sources by passing through the first and second diffraction optical elements. Light from the secondary light sources passing through the condenser lens generates Kohler illumination on a surface to be irradiated.

Illumination optical system and exposure apparatus having the same

The present invention is characterized in that when a phototaking lens system forms image information on a image pickup device in which a plurality of light-receiving elements are arranged in a non-square lattice pattern and a signal from the image pickup device is sampled in a square lattice to obtain a two-dimensional digital image, the phototaking lens system forms an image as optically correcting for a distortion of aspect ratio of image caused upon sampling in the square lattice.

Optical apparatus

A device includes a zoom lens having a focusing lens the position of which varies according to a zooming operation, a first moving part arranged to mechanically move the focusing lens according to the zooming operation, and a second moving part arranged to move the focusing lens in such a way as to electrically correct any shift of focus that results from the movement of the focusing lens caused by the first moving part.

Zoom lens

There is disclosed an image display control system comprising a display device for forming an image, a detection device for detecting the moving direction or moving velocity of the visual axis of an eye of the observer, and a control device for controlling the display state of the display device according to the detection signal from the detection device, or an image display device capable of detecting the moving direction or moving velocity of the visual axis thereby anticipating the position of the gazing point of the observer.

Growing community of inventors

Utsunomiya, Japan

Satoru Mizouchi