Central Glass Company, Limited

Shin-etsu Chemical Co., Ltd.

Matsushita Electric Industrial Co., Ltd.

Other

Panasonic Corporation

F-tech Inc.

Satoru Miyazawa

Kazuhiko Maeda

Jun Hatakeyama

Yoshio Kawai

Yuji Harada

Michitaka Ootani

Masaru Sasago

Masayuki Endo

Shinji Kishimura

Kentaro Tsutsumi

Haruhiko Komoriya

Satoru Kobayashi

Jun Watanabe

Takeo Komata

Shoji Arai

Katsunori Kawamura

Kenji Tokuhisa

Asuka Sano

Yusuke Kuramoto

Shinichi Sumida

Shinya Akiba

Kei Matsunaga

Yuzuru Kaneko

Keiko Sasaki

Yusuke Nomura

Makoto Kobayashi

Akihiro Ishii

Mikihiro Takahashi

Takashi Ootsuka

Ryo Nadano

Hideyuki Tsuruta

Takako Yamazaki

Masataka Fujimoto

Yoshiki Hirotsu

Takahisa Tada

Seiji Murata

An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.

Photosensitive resin composition, method for producing cured product of fluororesin, fluororesin, fluororesin film, bank and display element

The present invention is directed to a purification method for purifying a fluorine-containing polymerizable monomer of the formula (1), in which the fluorine-containing polymerizable monomer is purified by distillation in the coexistence of a phenolic compound A such as 6-tert-butyl-2,4-xylenol and a phenolic compound B such as 2,2'-methylene-bis(4-methyl-6-tert-butylphenol). By the combined use of the phenolic compound A and the phenolic compound B, it is possible to significantly suppress polymerization or oligomerization of the fluorine-containing polymerizable monomer even during industrial-production-scale distillation and efficiently purify the fluorine-containing polymerizable monomer by distillation.

Method for purifying polymerizable fluoromonomer by distillation

According to the present invention, there is provided a production process of a 2-fluoroacrylic ester including: a bromination step of converting a 2-fluoropropionic ester to a 2-bromo-2-fluoropropionic ester by reaction of the 2-fluoropropionic ester with a nitrogen-bromine bond-containing brominating agent in the presence of a radical initiator; and a dehydrobromination step of reacting the 2-bromo-2-fluoropropionic ester with a base. It is not necessary in this process to adopt very-low-temperature conditions and to use a stoichiometric amount of expensive reagent. The target 2-fluoroacrylic ester can be thus produced at low cost.

Process for preparation of 2-fluoroacrylic esters

A coating material including a low-molecular or medium-molecular organic compound represented by general formula (1). (In the formula, Ris a single bond, methylene, ethylene or oxygen; and Ris a hydrogen atom, or a hydrocarbon group, a fluorine-containing alkyl group, a cyclic form containing an aromatic group or aliphatic group, which may contain hydroxy group, carboxyl group, amino group, amide group, imide group, glycidyl group, cyano group, fluorocarbinol group, sulfonic group or sulfonylamide group, and a complex thereof, and may contain a fluorine atom, oxygen atom, nitrogen atom, silicon atom or sulfur atom, and R's of the same type or different type may be connected by an ester bond, amide bond, ether bond, thioether bond, thioester bond or urethane bond.). This compound can be derived from a diol compound and bicyclo[2.2.2]octane-2,3:5,6-tetracarboxylic anhydride.

Coating materials consisting of low- or medium-molecular organic compounds

The present invention relates to a novel fluorine-containing cyclic compound that is derived from a norbornadiene and hexafluoroacetone and has an oxacyclopentane structure. This compound may be represented by the following formula (1) or (2). Furthermore, the present invention relates to a fluorine-containing polymer compound prepared by a polymerization or copolymerization using this fluorine-containing cyclic compound or its derivative. By using such fluorine-containing polymer compound, it is possible to provide a superior resist material and a fine pattern forming process using the same. 

Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same

The present invention relates to a polymerizable monomer represented by the general formula (1), wherein Ris a hydrogen atom, a halogen atom, a hydrocarbon group or a fluorine-containing alkyl group; Ris a straight-chain or branched alkyl group, a cyclic alkyl group, an aromatic group, or a substituent having at least two of these groups, the Rbeing optionally partially fluorinated; Ris a hydrogen atom, a hydrocarbon group that is optionally branched, a fluorine-containing alkyl group, or a cyclic group having an aromatic or alicyclic structure, the Roptionally containing a bond of an oxygen atom or carbonyl group; and n is an integer of 1-2.

Fluorine-containing polymerisable monomer and polymer prepared by using same

The present invention relates to a polymerizable acrylate compound represented by the general formula (1): (in the formula, Rrepresents a hydrogen atom, halogen atom, hydrocarbon group or fluorine-containing alkyl group, Rand Rmay be different or identical, and each of them independently is a hydrogen atom, fluorine atom, hydrocarbon group optionally branched, fluorine-containing alkyl group, aromatic group, or cyclic structure containing an aliphatic group and may contain oxygen or carbonyl bond) and a polymer compound obtained by using the same.

Polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom

A resist protective coating material is provided comprising an &#x3b1;-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.

Resist protective coating material and patterning process

There is provided a novel polyester compound having in its main polymer chain an aliphatic cyclic structure with carboxylic acids or carboxylic acid ester groups as represented by the chemical formula (1), a resist material containing the polyester compound and a patterning method using the resist material. 

Polyester compound and resist material using the same

The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.

Top coat composition

A process for producing an &#x3b1;-substituted acrylic norbornanyl compound represented by the formula [3] includes reacting an &#x3b1;-substituted acrylic acid anhydride represented by the formula [1] with a substituted norbornanyl alcohol represented by the formula [2]. wherein Rrepresents a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, or perfluoroethyl group, and wherein one of R, Rand Ris a CFC(CF)(OH)CH&#x2014; group, and each of the other two of R, Rand Ris a hydrogen.

Process for producing &#x3b1;-substituted acrylic norbornanyyl compounds

A process for producing an acrylic ester compound includes reacting in the presence of alkene an alcohol represented by the formula (1),  

Process for producing acrylic ester compound

A polymer comprising recurring units of (1a) or (1b) wherein Ris an acid labile group, adhesive group or fluoroalkyl, Ris H, F, alkyl or fluoroalkyl, Rand Reach are a single bond, alkylene or fluoroalkylene, Ris H or an acid labile group, 'a' is 1 or 2, 0&#x3c;U11&#x3c;1 and 0&#x3c;U12&#x3c;1 and having a Mw of 1,000&#x2013;500,000 is used as a base resin to formulate a resist composition which is sensitive to high-energy radiation, maintains high transparency at a wavelength of up to 200 nm, and has improved alkali dissolution contrast and plasma etching resistance. 

Polymers, resist compositions and patterning process

A sulfonate compound having formula (1) is novel wherein Rto Rare H, F or Calkyl or fluoroalkyl, at least one of Rto Rcontains F. A polymer comprising units derived from the sulfonate compound is used as a base resin to formulate a resist composition which is sensitive to high-energy radiation, maintains high transparency at a wavelength of up to 200 nm, and has improved alkali dissolution contrast and plasma etching resistance 

Sulfonates, polymers, resist compositions and patterning process

Growing community of inventors

Kawagoe, Japan

Satoru Miyazawa