Hitachi, Ltd.

Satoru Amo

Akio Takahashi

Haruo Akahoshi

Takeyuki Itabashi

Shin Nishimura

Masashi Miyazaki

Toshinari Takada

Rituji Toba

Fujiko Yutani

A process is provided for the formation of a conductive circuit pattern on a base metal formed on a substrate. On the base metal, a plating resist is first provided in a pattern corresponding to the circuit to be formed and a circuit pattern is then formed by plating. The plating resist is treated with a stripper and then with a stripping residue remover to cut off chemical bonds in the resist by a dehydrating decomposition reaction. The base metal is treated with an etchant for the base metal, whereby any resist residue still remaining after the treatment with the stripping residue remover is removed and the base metal are etched at areas which were covered by the plating resist.

Process for the formation of a conductive circuit pattern

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Hitachi, Japan

Satoru Amo