Jsr Corporation

Tri Chemical Laboratories Inc.

Sanshiro Komiya

Tatsuya Sakai

Hideki Nishimura

Kang-go Chung

Ryuuichi Saitou

Naofumi Nomura

Naoto Noda

Maki Nishiguchi

A diruthenium complex such as tetra(&#x3bc;-formato)diruthenium(II,II) or tetra(&#x3bc;-formato)(dehydrate)diruthenium(II,II), a material for chemical vapor deposition which comprises the complex, and a method of forming a ruthenium film from the material by chemical vapor deposition.

Diruthenium complex, and material and method for chemical vapor deposition

A method for producing ruthenium compound including the step of reacting a compound represented by General Formula (1): RuL(wherein Lrepresents an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and at least two double bonds) with trifluorophosphine or reacting the compound represented by General Formula (1) with trifluorophosphine, and hydrogen or a halogen to obtain a compound represented by General Formula (2): Ru(PF)(L)(L)(wherein Lrepresents a hydrogen atom or halogen atom, Lrepresents an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and at least two double bonds, l is an integer from 1 to 5, m is an integer from 0 to 4, and n is an integer from 0 to 2, provided that l+m+2n=5 or 6). With this method, a trifluorophosphine-ruthenium compound can be synthesized under low-temperature and low-pressure conditions.

Method for producing ruthenium compound

Growing community of inventors

Fuchu, Japan

Sanshiro Komiya