Samsung Electronics Co., Ltd.

Korea Institute of Science and Technology

Sangrok Oh

Hyungjun Kim

Kyunghwan Lee

Jaejin Lee

Taikjin Lee

Jongwoo Sun

Ilyoung Han

Hyoungseok Kim

Nohsung Kwak

Haejoong Park

Jungpyo Hong

Sungyeon Kim

Kwangsoo Han

Kwangnam Kim

Eunwoo Lee

Soohyun Park

JuYoung Lee

Yonglim Lee

Jungmo Sung

Wookdam Jung

Chuwon Nho

Taeksung Lee

Unseok Lee

Manjae Kwon

Changho Jhin

Sungyul Chang

Jungseok Yang

Juyeon Lee

Junwoo Park

An example wearable electronic device may include a main body including a first surface having an opening area formed therein, wherein a plurality of lateral walls, surrounding at least one part of the opening area, are formed in the peripheral area of the opening area; a display disposed inside the main body and which is viewable through the opening area; a wheel including a mounted part, which is at least partially mounted on the peripheral area, and an extension part which extends in the inward direction from the mounted part, wherein the wheel is formed in a ring shape extending in the circumferential direction with respect to a rotation axis of the wheel; and a guide member partially coming into contact with the main body and the wheel, respectively, and for guiding the rotation of the wheel. The guide member may include a first part having at least one portion thereof extending to a space between the plurality of lateral walls and a second part at least partially inserted to a first recess formed in each of the plurality of lateral walls.

Wearable electronic device including wheel

A semiconductor manufacturing apparatus including at least one load module including a load port on which a substrate container is located, a plurality of substrates being mountable on the substrate container; at least one loadlock module including a loadlock chamber directly connected to the substrate container, the loadlock chamber interchangeably having atmospheric pressure and vacuum pressure, a first transfer robot within the loadlock chamber, and a substrate stage within the loadlock chamber, the plurality of substrates being mountable on the substrate stage; a transfer module including a transfer chamber connected to the loadlock chamber, a second transfer robot within the transfer chamber, and a substrate aligner within the transfer chamber; and at least one process module including at least one process chamber connected to the transfer module.

Semiconductor manufacturing apparatus

A method of forming patterns of a semiconductor device includes forming a photoresist pattern, which contains a first carbon compound, on a substrate, reforming a top surface of the photoresist pattern to form an upper mask layer which contains a second carbon compound, different from the first carbon compound, on the photoresist pattern, and etching a portion of the substrate using the upper mask layer and the photoresist pattern as an etch mask.

Method of etching substrate

Growing community of inventors

Yongin-si, South Korea

Sangrok Oh