Entegris, Inc.

Samsung Electronics Co., Ltd.

SangJin Lee

Sungjin Park

Thomas H Baum

Bryan Clark Hendrix

Sangjin Kim

Yoonhae Kim

Eungryeol Seo

Seobong Chang

Sungsil Cho

Jae Eon Park

Myoungkeun Kwon

Gwanglim Lee

Soochan Lim

Changhoon Oh

Doyoun Kang

Boram Park

SeongCheol Kim

YeRim Yeon

KieJin Park

MinSeok Ryu

DaHye Kim

SooJin Lee

A cooking device includes a main body including an upper side and a lower side opposing each other, a cooking surface at the upper side of the main body, and an air shield generator which draws air from outside the main body, at the lower side of the main body, and provides the air to outside of the main body as an air shield which is at the upper side of the main body, adjacent to the cooking surface and flowing in a direction away from the cooking surface.

Cooking device

Some embodiments relate to a precursor comprising a precursor for vapor deposition. The precursor comprises an aliphatic hydrocarbon and at least one disilylamine group. The at least one disilylamine group is attached to the aliphatic hydrocarbon. The at least one disilylamine group does not comprise a silanide group. Some embodiments relate to a method for making the precursor. The method comprises reacting a polyamine compound and a silylhalide compound in a presence of a base to form a precursor useful for vapor deposition. Some embodiments relate to a method for forming a silicon-containing film using the precursor.

Precursors and related methods

Provided are certain liquid silicon precursors useful for the deposition of silicon-containing films, such as films comprising silicon, silicon nitride, silicon oxynitride, silicon dioxide, silicon carbide, carbon-doped silicon nitride, or carbon-doped silicon oxynitride. Also provided are methods for forming such films utilizing vapor deposition techniques.

Precursors and methods for preparing silicon-containing films

Growing community of inventors

Suwon-si, South Korea

SangJin Lee