Az Electronic Materials USA Corp.

SangHo Lee

Ralph R Dammel

M Dalil Rahman

Munirathna Padmanaban

Francis Michael Houlihan

Clement Anyadiegwu

David L Rentkiewicz

Takanori Kudo

The present application relates to a compound of formula A-X&#x2014;B, where (i) A-X&#x2014;B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R&#x2014;SOor (ii) A-X&#x2014;B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q, R, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.

Photoactive compounds

The present application relates to a compound of formula A-X&#x2014;B, where (i)A-X&#x2014;B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R&#x2014;SOor (ii)A-X&#x2014;B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q, R, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.

The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators. The novel photoresist comprises a) a polymer containing an acid labile group, and b) a novel mixture of photoactive compounds, where the mixture comprises a lower absorbing compound selected from structure 1 and 2, and a higher absorbing compound selected from structure 4 and 5,

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Bridgewater, NJ, United States of America

SangHo Lee