Lg Innotek Co., Ltd.

Sang Yu Lee

Dong Mug Seong

Hae Sik Kim

Tae Hoon Han

Hyo Won Son

Jong Min Yun

Sang Beum Lee

Su Hyeon Cho

Jae Hong Lee

Jae Wan Park

Jee Heum Paik

Yeong Deuk Jo

Soo Jin Lee

Yeong Soo Choi

A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.

Metal plate for deposition mask, and deposition mask and manufacturing method therefor

Disclosed is an electrode member. The electrode member includes a substrate, and an electrode provided in the shape of a mesh on the substrate.

Electrode member and touch window including the same

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Seoul, South Korea

Sang Yu Lee