Samsung Display Co., Ltd.

Samsung Mobile Display Co., Ltd.

Sang-Yon Yoon

Ki-Yong Lee

Dong-Hyun Lee

Jin-Wook Seo

Byoung-Keon Park

Yun-Mo Chung

Tae-Hoon Yang

Kil-Won Lee

Jong-Ryuk Park

Dae-Woo Lee

Jong-Won Hong

Bo-Kyung Choi

Heung-Yeol Na

Min-Jae Jeong

Seok-Rak Chang

Young-Dae Kim

Jae-Wan Jung

Ji-Su Ahn

Eu-Gene Kang

Maxim Lisachenko

A method of forming a polycrystalline silicon layer and an atomic layer deposition apparatus used for the same. The method includes forming an amorphous silicon layer on a substrate, exposing the substrate having the amorphous silicon layer to a hydrophilic or hydrophobic gas atmosphere, placing a mask having at least one open and at least one closed portion over the amorphous silicon layer, irradiating UV light toward the amorphous silicon layer and the mask using a UV lamp, depositing a crystallization-inducing metal on the amorphous silicon layer, and annealing the substrate to crystallize the amorphous silicon layer into a polycrystalline silicon layer. This method and apparatus provide for controlling the seed position and grain size in the formation of a polycrystalline silicon layer.

Method of forming polycrystalline silicon layer and atomic layer deposition apparatus used for the same

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Yongin, South Korea

Sang-Yon Yoon