Adaptive Plasma Technology Corp.

V-m Corporation

Sang Woo Lee

Woo Hyung Choi

Jong Hee Kim

Ki Hoon Jo

Gyoung Ho Kwon

Hwi Gon Jang

Provided is an electrostatic chuck with multiple heater zones. The electrostatic chuck with multiple heater zones comprises multiple micro heater zones; a switch module having each switching means connected to each micro heater zone; and a switch controlling module for controlling an operation of the switch module, wherein each micro heater zone can be heated individually by a corresponding heating element, and each partial area of a wafer secured on the electrostatic chuck is heated independently by each micro heater zone.

Electrostatic chuck with multiple heater zones

Provided is a particle trapping apparatus for preventing an error of a pressure measurement. A particle trapping apparatus for preventing an error of a pressure measurement includes a pressure-measuring means; a measuring pipe for connecting the pressure-measuring means to a processing chamber; and a trapping means for capturing particles in a gas flowing through the measuring pipe, wherein the trapping means is coupled to the measuring pipe or is a portion of the measuring pipe.

Particle trapping apparatus for preventing an error of a pressure measurement

Provided is an apparatus for monitoring an exchanging process of a semiconductor part and a method for the same. The apparatus comprises finger having a structure capable of loading the part and transferred by a robot for exchanging; and at least one image obtaining means coupled to the finger and obtaining an image of an exchanging position.

Apparatus for monitoring an exchanging process of a semiconductor part and a method for the same

Provided is a structure variable type of a plasma source coil and a method for controlling the same. The plasma source coil comprises a plurality of coil branches extending in a spiral shape based on a central part, wherein at least one coil branch has a structure in which the extending direction or a tilting level can be adjusted.

Structure variable type of a plasma source coil and a method for controlling the same

Provided is a separate plasma source coil and a method of controlling the same. The separate plasma source coil includes a center coil group disposed around a coil center and including one or more linear center coils, and an edge coil group disposed around the center coil group and including one or more linear edge coils.

Growing community of inventors

Suwon-si, South Korea

Sang Woo Lee