Asml Netherlands B.v.

Sang Uk Kim

Daan Maurits Slotboom

Sarathi Roy

Yichen Zhang

Hadi Yagubizade

Xiuhong Wei

Mohammad Reza Kamali

Yingchao Cui

Jeonghyun Park

A method for determining lithographic matching performance includes obtaining first monitoring data from recurrent monitoring for stability control for an available EUV scanner. For a DUV scanner, second monitoring data is similarly obtained from recurrent monitoring for stability control. The EUV first monitoring data are in a first layout. The DUV second monitoring data are in a second layout. A cross-platform overlay matching performance between the first lithographic apparatus and the second lithographic apparatus is determined based on the first monitoring data and the second monitoring data. This is done by reconstructing the first and/or second monitoring data into a common layout to allow comparison of the first and second monitoring data.

Determining lithographic matching performance

Growing community of inventors

Yong-In, South Korea

Sang Uk Kim