Samsung Display Co., Ltd.

Nanoprotech Co., Ltd.

Sang Tae Kim

Seung Bo Shim

Dong Hee Lee

Jin Suek Kim

Beom Soo Kim

Bong Kyun Kim

Yeong Ryeol Kim

Jin Yong Kim

In Seol Kuk

Cheul Ock Chae

Young Jin Yoon

Shin Hyuk Choi

Dae Sung Lim

Seung Hee Kim

Young Chul Park

An etchant composition may include: a peroxosulfate; a cyclic amine compound; a first amphoteric compound including a carboxyl group; and a second amphoteric compound including a sulfone group, wherein the second amphoteric compound may be different from the first amphoteric compound.

Etchant composition and method of manufacturing wiring substrate using the same

Provided are an apparatus and a method of detecting a foreign material capable of detecting only a foreign material on a surface of a substrate except for a foreign material on a lower surface of the substrate in a manufacturing process of a transparent substrate passing light therethrough, such as a glass substrate used in a flat panel display (FPD) such as a liquid crystal display (LCD), an organic light emitting diode (OLED), a plasma display panel (PDP), a sapphire wafer used in some of semiconductors, or the like, and in a pattern forming process in a manufacturing process of the FPD and the semiconductor using the transparent substrate.

Method of detecting foreign material on upper surface of transparent substrate using polarized light

Growing community of inventors

Iksan-si, South Korea

Sang Tae Kim