Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

Dongwoo Fine-chem

Seagate Technology Incorporated

Sang-tae Kim

Young-Chul Park

In-Ho Yu

Suck-Jun Lee

Joon-Woo Lee

Sang-Hoon Jang

Young-Jun Jin

O-Byoung Kwon

Min-Ki Lim

Hong-Sick Park

Young-Jin Yoon

Seon-Il Kim

Kyong-ho Lee

Jong-Hyun Choung

Yu-Jin Lee

Chul-ho Jeon

Seong-min Kim

Kyong-Min Kang

Dong-Ki Kim

Yun-Je Oh

Yong-Sun Ko

Seung-Yong Lee

Shin-Il Choi

Wang Woo Lee

Byeong-Jin Lee

Jung-Min Oh

Hyo-San Lee

Ji-Young Park

Hyun-woo Lee

Young-won Lee

In-Bae Kim

Ji-Hoon Jeong

In-Gi Kim

Wang-Woo Lee

Dong-jun Kum

Jae-Woo Jeong

Shi-Jin Sung

Seung-Jae Yang

Byung-yeob Park

In Seol Kuk

Hye-Ra Shin

Keyong Bo Shim

Mi-Hyun Park

Na-Rim Kim

Sang-Gab Kim

Hyun-Seok Kim

Sang Gab Kim

Seung-jun Lee

Hi-Kuk Lee

Yong-Il Kim

Dae-myung Kim

Cha-Dong Kim

Sung Hee Lee

Gug Rae Jo

Jung-In Park

Toshikazu Takayanagi

Baik-soon Choi

Pyeong-Hwan Wee

Hong-Sik Park

Su-Yeon Sim

Yong Seok Choi

Jae Hyuk Chang

Jae-soo Lee

Jun-kyoung Lee

Sue-ryeon Kim

Seung-Hyun Ahn

Sang Hyun Yun

In Kak Song

Young-taek Hong

Jong-hoon Lim

Ahn-Ho Lee

Sang-bong Park

Young-sik Lim

Sung-bae Kim

Eun-Sang Lee

In-goo Kang

Sung-Yeol Jin

Hyo-Joong Yoon

Soon-Hong Bang

Sung Bae Moon

Sung Joong Yun

Jin-Seok Yang

Hyung-pyo Hong

Jeong-gyun Yu

Compositions for removing silicone resins and methods of thinning a substrate by using the same, as well as related methods, apparatus and systems for facilitating the removal of silicone resins are provided. The compositions for removing silicone resins, may include a heterocyclic solvent and an alkyl ammonium fluoride salt represented by a formula, (R)NF, wherein R is a C1 to C4 linear alkyl group. Silicone resins may be effectively removed by using the compositions since the compositions exhibit an excellent decomposition rate with respect to the silicone resins that remain on a semiconductor substrate in a process of backside grinding of the semiconductor substrate, backside electrode formation, or the like.

Composition for removing silicone resins and method of thinning substrate by using the same

A multi-subscriber identification module (SIM) device is provided. The multi-SIM device includes a first SIM interface; a second SIM interface; and at least one processor configured to implement: a base station (BS) searcher configured to perform a resynchronization operation for securing synchronization with a BS or a measurement operation for measuring signal quality of the BS based on a request received from the first SIM interface; and a searcher scheduler configured to receive the request for use of the BS searcher from the first SIM interface, and identify whether the first SIM interface is granted use of the BS searcher based on the request and a schedule for the BS searcher.

Multi-SIM device for performing scheduling for base station searcher and method of scheduling base station search

A composition for removing photoresist, including an alkyl ammonium fluoride salt in an amount ranging from about 0.5 weight percent to about 10 weight percent, based on a total weight of the composition; an organic sulfonic acid in an amount ranging from about 1 weight percent to about 20 weight percent, based on the total weight of the composition; and a lactone-based solvent in an amount ranging from about 70 weight percent to about 98.5 weight percent, based on the total weight of the composition.

Compositions for removing photoresist

Methods of manufacturing semiconductor devices using a composition for removing photoresist and methods of removing photoresist from a semiconductor substrate

A digital photographing system includes a smart mount that includes lenses, a shutter, an image sensor, and an image processor, combined with a camera body or a mobile terminal device. A method of operating the digital photographing system is provided. The digital photographing system includes a lens; a smart mount that captures and processes an image of an object input via the lens; and a body that displays, modifies, stores, or deletes the image captured and processed by the smart mount.

Attachable digital photographing system and operation method thereof

A thinner composition including an acetate-based compound in an amount in a range of about 30 weight percent to about 70 weight percent, a lactate-based compound in an amount in a range of about 1 weight percent to about 20 weight percent, a propionate-based compound in an amount in a range of about 30 weight percent to about 60 weight percent, and an ether-based additive in an amount in a range of about 10 ppm to about 500 ppm, based on a total amount of the composition.

Thinner compositions

Digital photographing system and method of operating digital photographing system

A etchant composition that includes, based on a total weight of the etchant composition, about 0.5 wt % to about 20 wt % of a persulfate, about 0.5 wt % to about 0.9 wt % of an ammonium fluoride, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 10.0 wt % of a sulfonic acid, about 5 wt % to about 10 wt % of an organic acid or a salt thereof, and a remainder of water. The etchant composition may be configured to etch a metal layer including copper and titanium, to form a metal wire that may be included in a thin film transistor array panel of a display device.

Etchant composition and method of forming metal wire and thin film transistor array panel using the same

An etchant includes: 5 to 20 wt % of persulfate, 1 to 10 wt % of at least one compound of an inorganic acid, an inorganic acid salt, or a mixture thereof, 0.3 to 5 wt % of a cyclic amine compound, 1 to 10 wt % of at least one compound of an organic acid, an organic acid salt, or a mixture thereof, 0.1 to 5 wt % of p-toluenesulfonic acid, and water, based on the total weight of the etchant. A copper-titanium etchant further includes 0.01 to 2 wt % of a fluoride-containing compound. A method of forming a display device using the etchant, and a display device, are also disclosed.

Etchant, display device and method for manufacturing display device using the same

Exemplary embodiments of the present invention disclose a non-halogenated etchant for etching an indium oxide layer and a method of manufacturing a display substrate using the non-halogenated etchant, the non-halogenated etchant including nitric acid, sulfuric acid, a corrosion inhibitor including ammonium, a cyclic amine-based compound, and water.

Non-halogenated etchant and method of manufacturing a display substrate using the non-halogenated etchant

A photographing apparatus includes: a lens unit; a light transmission adjustment unit that adjusts light transmittance of light that passes through the lens unit; a photographing unit that is disposed a reflected light path of the light transmission adjustment unit and that generates an image data according to received light, and a view finder that is disposed on a transmitted light path of the light transmission unit.

Photographing apparatus and method

A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.

Photoresist composition, method of forming a pattern using the same, and method of manufacturing a display substrate

An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH)-containing compound, a cyclic amine compound, and the remaining amount of water.

Method of etching a pixel electrode

Growing community of inventors

Iksan-si, South Korea

Sang-tae Kim